Volume 214, Issue 8 1600840
Original Paper

Analysis of carrier trapping and emission in AlGaN/GaN HEMT with bias-controllable field plate

Suguru Mase

Corresponding Author

Suguru Mase

Research Center for Nano-Devices and Advanced Materials, Nagoya Institute of Technology, Nagoya, Japan

Corresponding author: e-mail [email protected], Phone: +81 52 732 5093, Fax: +81 52 732 5580

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Akio Wakejima

Akio Wakejima

Electrical and Mechanical Engineering, Nagoya Institute of Technology, Nagoya, Japan

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Takashi Egawa

Takashi Egawa

Research Center for Nano-Devices and Advanced Materials, Nagoya Institute of Technology, Nagoya, Japan

Innovation Center for Multi-Business of Nitride Semiconductors, Nagoya Institute of Technology, Nagoya, Japan

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First published: 16 June 2017
Citations: 5

Abstract

We analyzed carrier trapping in AlGaN/GaN HEMT occurring between gate and drain with a bias-controllable Field Plate (CFP) on a Si3N4 passivation, which is structurally and electrically independent from other electrodes. We observed the recovery of a transient drain current which was associated with carrier emission after the momentary pulse bias of CFP. From the temperature dependence of pulsed I–V measurements, an activation energy of the trap state was 0.083 eV and capture cross section was 2.0 × 10−24 cm−2. This value is the same to the activation energy of the surface leakage current in AlGaN/GaN HEMT with Si3N4 passivation. The trap state with the activation energy of 0.083 eV has important role in pulse operation of AlGaN/GaN FP-HEMT with Si3N4 passivation.

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