Volume 214, Issue 8 1600829
Original Paper

Facet dependence of leakage current and carrier concentration in m-plane GaN Schottky barrier diode fabricated with MOVPE

Atsushi Tanaka

Corresponding Author

Atsushi Tanaka

Institute of Materials and Systems for Sustainability, Nagoya University, Furo-cho, Chikusa-ku, 464-8603 Nagoya, Japan

Corresponding author: e-mail [email protected], Phone: +8152-789-5275, Fax: +8152-789-3156

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Ousmane1 Barry

Ousmane1 Barry

Department of Electrical Engineering and Computer Science, Nagoya University, Furo-cho, Chikusa-ku, 464-8603 Nagoya, Japan

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Kentaro Nagamatsu

Kentaro Nagamatsu

Institute of Materials and Systems for Sustainability, Nagoya University, Furo-cho, Chikusa-ku, 464-8603 Nagoya, Japan

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Junya Matsushita

Junya Matsushita

Department of Electrical Engineering and Computer Science, Nagoya University, Furo-cho, Chikusa-ku, 464-8603 Nagoya, Japan

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Manato Deki

Manato Deki

Institute of Materials and Systems for Sustainability, Nagoya University, Furo-cho, Chikusa-ku, 464-8603 Nagoya, Japan

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Yuto Ando

Yuto Ando

Department of Electrical Engineering and Computer Science, Nagoya University, Furo-cho, Chikusa-ku, 464-8603 Nagoya, Japan

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Maki Kushimoto

Maki Kushimoto

Department of Electrical Engineering and Computer Science, Nagoya University, Furo-cho, Chikusa-ku, 464-8603 Nagoya, Japan

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Shugo Nitta

Shugo Nitta

Institute of Materials and Systems for Sustainability, Nagoya University, Furo-cho, Chikusa-ku, 464-8603 Nagoya, Japan

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Yoshio Honda

Yoshio Honda

Institute of Materials and Systems for Sustainability, Nagoya University, Furo-cho, Chikusa-ku, 464-8603 Nagoya, Japan

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Hiroshi Amano

Hiroshi Amano

Institute of Materials and Systems for Sustainability, Nagoya University, Furo-cho, Chikusa-ku, 464-8603 Nagoya, Japan

Akasaki Research Center, Nagoya University, Furo-cho, Chikusa-ku, 464-8603 Nagoya, Japan

Venture Business Laboratory, Nagoya University, Furo-cho, Chikusa-ku, 464-8603 Nagoya, Japan

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First published: 04 July 2017
Citations: 14

Abstract

In this study, GaN m-plane Schottky barrier diodes fabricated with a metalorganic vapor-phase epitaxy on a GaN substrate were investigated using emission microscope, photoluminescence, and cathodoluminescence. In addition, facet dependence of leakage current under reverse-biased condition was observed. We showed that the leakage-current distribution was caused by the facet dependence of the carrier concentration and oxygen concentration. These results can provide important suggestions for the fabrication of m-plane devices.pssa201600829-gra-0001

(a) four-faceted hillocks on m-plane GaN MOVPE sample, facet dependence of (b) leakage current and (c) PL peak intensity of the m-plane GaN Schottky barrier diode.

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