Rapid and Selective Photo-degradation of Polymers: Design of an Alternating Copolymer with an o-Nitrobenzyl Ether Pendant
Hiroyuki Kubota
Department of Polymer Chemistry, Graduate School of Engineering, Kyoto University Nishikyo-ku, Kyoto, 615-8510 Japan
Search for more papers by this authorCorresponding Author
Prof. Makoto Ouchi
Department of Polymer Chemistry, Graduate School of Engineering, Kyoto University Nishikyo-ku, Kyoto, 615-8510 Japan
Search for more papers by this authorHiroyuki Kubota
Department of Polymer Chemistry, Graduate School of Engineering, Kyoto University Nishikyo-ku, Kyoto, 615-8510 Japan
Search for more papers by this authorCorresponding Author
Prof. Makoto Ouchi
Department of Polymer Chemistry, Graduate School of Engineering, Kyoto University Nishikyo-ku, Kyoto, 615-8510 Japan
Search for more papers by this authorAbstract
The development of polymers with on-demand degradability is required to alleviate the current global issues on polymer-waste pollution. Therefore, we designed a vinyl ether monomer with an o-nitrobenzyl (oNBn) group as a photo-deprotectable pendant (oNBnVE) and synthesized an alternating copolymer with an oNBn-capped acetal backbone via cationic copolymerization with p-tolualdehyde (pMeBzA). The resultant alternating copolymer could be rapidly degraded into lower-molecular-weight compounds upon simple exposure to UV irradiation without any reactants or catalysts, while it was sufficiently stable toward heat and ambient light. This degradation proceeds via cleavage of the hemiacetal structure generated upon photo-deprotection of the oNBn pendant. The oNBn-peculiar degradability allowed the exclusive photo-degradation of the oNBnVE/pMeBzA segments in a diblock copolymer composed of oNBnVE/pMeBzA and benzyl vinyl ether (BnVE)/pMeBzA segments.
Open Research
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