Morre's law is coming to an end only if the memory industry can keep stuffing the devices with new functionality. Halide perovskite acts as a promising candidate for application in next-generation nonvolatile memory. As is well known, the switching ratio is the key device requirement of resistive memory to improve recognition accuracy. Here, the authors introduce an all-inorganic halide perovskite CsPbBr₃ single crystal film (SCF) into resistive memory as an active layer. The Ag/CsPbBr₃/Ag memory cells exhibit reproducible resistive switching with an ultrahigh switching ratio (over 10⁹) and a fast switching speed (1.8 µs). It is studied that the Schottky barrier of metal/CsPbBr₃ SCF contact follows the tendency of Schottky–Mott theory, and the Fermi level pinning effect is effectively reduced. The interface S parameter of metal/CsPbBr₃ SCF contact is 0.50, suggesting a great interface contact is formed. The great interface contact contributes to the steady high resistance state (HRS), and then the steady HRS leads to an ultrahigh resistive switching ratio. This work demonstrates high performance from halide perovskite SCF-based memory. The introduction of halide perovskite SCF in resistive random access memory provides great potential as an alternative in future computing systems.