Volume 12, Issue 8 pp. 1136-1139
Contributed Article

Peculiarities of defect generation under injection current in LEDs based on group-III nitride3N nanostructures

Natalia Shmidt

Corresponding Author

Natalia Shmidt

Ioffe Physical Technical Institute, Polytekhnicheskaya 26, 194021 St. Petersburg, Russia

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Evgeniia Shabunina

Evgeniia Shabunina

Ioffe Physical Technical Institute, Polytekhnicheskaya 26, 194021 St. Petersburg, Russia

Phone: +07 812 292 7193

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Alexander Usikov

Alexander Usikov

Nitride Crystals, Inc., 181E Industry Ct., Ste. B, Deer Park, NY 11729, USA

Saint-Petersburg National Research University of Information Technologies, Mechanics and Optics, 49 Kronverkskiy Ave., 197101 Saint Petersburg, Russia

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Anton Chernyakov

Anton Chernyakov

Ioffe Physical Technical Institute, Polytekhnicheskaya 26, 194021 St. Petersburg, Russia

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Sergey Kurin

Sergey Kurin

Nitride Crystals, Inc., 181E Industry Ct., Ste. B, Deer Park, NY 11729, USA

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Hikki Helava

Hikki Helava

Nitride Crystals, Inc., 181E Industry Ct., Ste. B, Deer Park, NY 11729, USA

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Yuri Makarov

Yuri Makarov

Nitride Crystals, Inc., 181E Industry Ct., Ste. B, Deer Park, NY 11729, USA

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First published: 11 May 2015
Citations: 6

Abstract

It has been demonstrated that, along with well-known mechanisms of defect generation (DG) under injection current in fabricated UV- and commercial blue-LED chips based on A3N nanostructures, other defect generation mechanisms are possible in local regions. Aging experiments performed simultaneously with analysis of evolution of I-V characteristics at U < 2 V and spectral noise density dependences on current density, revealed DG with participation of multi-phonon recombination of carriers in an extended defect system and local regions of random alloy fluctuations enriched by metallic atoms (Ga or In). (© 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)

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