Volume 12, Issue 8 pp. 1123-1128
Contributed Article

Electronic structure of threading dislocations in wurtzite GaN

I. Belabbas

Corresponding Author

I. Belabbas

Groupe de Cristallographie et de Simulation des Matériaux, Laboratoire de Physico-Chimie des Matériaux et Catalyse, Faculté des Sciences Exactes, Université de Bejaia, Bejaia 06000, Algérie

Phone: +213 7 93 41 22 02, Fax: +213 34 21 59 86, Web: https://www.researchgate.net/profile/Imad_BelabbasSearch for more papers by this author
J. Chen

J. Chen

CIMAP-Alençon, UMR6252 CNRS-CEA-ENSICAEN, Université de Caen Basse-Normandie, 14032 Caen cedex, France

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G. Nouet

G. Nouet

CIMAP, 6 Boulevard du Maréchal Juin, 14050 Caen cedex, France

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First published: 13 May 2015
Citations: 11

Abstract

We have carried out atomistic simulations, based on density functional theory, to investigate the atomic and electronic structures of the three types of prismatic threading dislocations in hexagonal gallium nitride. Screw and mixed threading dislocations were demonstrated to introduce both deep and shallow gap states, while most of core configurations of the edge dislocation introduce solely shallow states. The higher electrical activity of both screw and mixed dislocations, compared to the edge one, is correlated with the high dispersion of their energy levels, within the GaN bandgap. (© 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)

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