Volume 8, Issue 3 pp. 875-878
EMRS-I – Contributed Article

Temperature effect on an N-channel commercial VDMOSFET transistor

Nadine Abboud

Corresponding Author

Nadine Abboud

LPA, Department of Physics, Faculty of Sciences 2, Lebanese University, 90656 Fanar, Lebanon

IES, Institut d'Electronique du Sud, University of Montpellier 2, 34095 Montpellier, France

Phone: +33645011095 and +9613184498Search for more papers by this author
Chafic Salame

Chafic Salame

LPA, Department of Physics, Faculty of Sciences 2, Lebanese University, 90656 Fanar, Lebanon

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Yvan Cuminal

Yvan Cuminal

IES, Institut d'Electronique du Sud, University of Montpellier 2, 34095 Montpellier, France

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Alain Foucaran

Alain Foucaran

IES, Institut d'Electronique du Sud, University of Montpellier 2, 34095 Montpellier, France

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Alain Hoffmann

Alain Hoffmann

IES, Institut d'Electronique du Sud, University of Montpellier 2, 34095 Montpellier, France

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First published: 25 January 2011
Citations: 1

Abstract

High temperature effect on MOSFET devices was evaluated by exposing the silicon devices to a temperature value above the normal operating range in order to study the device behavior under extreme conditions. Measurements show an increasing in the saturation drain-source current and the reverse drain-source current with temperature while the transistor threshold voltage and the diffusion voltage of the integrated pn junction were decreased. The carrier's mobility shows an increasing with temperature while the drain-source on-resistance was decreased. Switching times are also investigated as function of temperature and important variations are obtained on the device turn-on and turn-off times. (© 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)

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