Optically modulated resistive switching in BiFeO3 thin film
Corresponding Author
Kashinath Bogle
School of Physical Sciences, Swami Ramanand Teerth Marathwada University, Nanded, 431606 India
Corresponding author: e-mail: [email protected], Phone: 02462 229559, Fax: 02462229245
Search for more papers by this authorRanjana Narwade
School of Physical Sciences, Swami Ramanand Teerth Marathwada University, Nanded, 431606 India
Search for more papers by this authorAmbadas Phatangare
Department of Physics, Savitribai Phule Pune University, Pune, 411007 India
Search for more papers by this authorShailendra Dahiwale
Department of Physics, Savitribai Phule Pune University, Pune, 411007 India
Search for more papers by this authorMegha Mahabole
School of Physical Sciences, Swami Ramanand Teerth Marathwada University, Nanded, 431606 India
Search for more papers by this authorRajendra Khairnar
School of Physical Sciences, Swami Ramanand Teerth Marathwada University, Nanded, 431606 India
Search for more papers by this authorCorresponding Author
Kashinath Bogle
School of Physical Sciences, Swami Ramanand Teerth Marathwada University, Nanded, 431606 India
Corresponding author: e-mail: [email protected], Phone: 02462 229559, Fax: 02462229245
Search for more papers by this authorRanjana Narwade
School of Physical Sciences, Swami Ramanand Teerth Marathwada University, Nanded, 431606 India
Search for more papers by this authorAmbadas Phatangare
Department of Physics, Savitribai Phule Pune University, Pune, 411007 India
Search for more papers by this authorShailendra Dahiwale
Department of Physics, Savitribai Phule Pune University, Pune, 411007 India
Search for more papers by this authorMegha Mahabole
School of Physical Sciences, Swami Ramanand Teerth Marathwada University, Nanded, 431606 India
Search for more papers by this authorRajendra Khairnar
School of Physical Sciences, Swami Ramanand Teerth Marathwada University, Nanded, 431606 India
Search for more papers by this authorAbstract
Exploiting the photosensitive property of BiFeO3 thin films, we demonstrated a resistive switching memory cell having low Vset voltage (+2.0 V), an ultrahigh ON/OFF ratio of ∼107 and a good retention time of more than 106 s. Synthesis conditions were optimized during a sol–gel-assisted spin-coating method to get phase-pure BiFeO3 films on Al substrate, at room temperature. Current–voltage analysis revealed that during optical illumination, photon-induced charge carriers migrate towards their respective electrodes along grain boundaries under an externally applied field, which initiate a substantial shift in the normal Vset of +10.4 V to a lower voltage (+2.0 V). The Poole–Frenkel emission at the metal/BiFeO3 interface is proposed and the role of electronic reconstruction at the interface is further investigated. Thus the write process in BiFeO3-based resistive-switching devices can be modulated in a controlled manner, which has the potential for integrating current resistive switching (memristive) memory device technology towards exciting optomemristive device technology.
Supporting Information
As a service to our authors and readers, this journal provides supporting information supplied by the authors. Such materials are peer reviewed and may be re-organized for online delivery, but are not copy-edited or typeset. Technical support issues arising from supporting information (other than missing files) should be addressed to the authors.
Filename | Description |
---|---|
pssa201533035-sup-0001-SupFig-S1.pdf120.5 KB |
Figure S1. XRD patterns of (i) aluminium substrate, (ii) and (iii) represents BFO thin films deposited for 10 and 20 repeated cycles during spin coating. Above mentioned substrate and films are annealed at 350 °C for 3 hour. XRD peaks indicate single phase perovskite structure of BFO with diffraction peaks assigned to (012), (112), (202), (116), (112) and (300) crystal planes [1]. The peaks indicated with star mark in the XRD spectrum are for the Al substrate and found in all the samples. The obvious peak splitting shows that the BFO films are rhombohedral in nature (space group: R3c) with lattice constant of a = b = c = 5.63 Å and α = β = γ = 59.4°, which are in good agreement with literature (JCPDS #20-0169). Figure S2. Optical absorption spectrum of BFO thin film deposited on glass substrate for 20 repeated spin cycles and annealed at 350 °C for 3 h. The inset shows the plot of (ahv)2 as a function of photon energy. The absorption cut-off wavelength is about 587 nm, suggesting that the BFO thin film absorb visible light in the wavelength range of 400–587 nm. The inset shows the plot of (ahv)2 as a function of photon energy. According to the classical Tauc's approach, the band gap of the BFO thin film was estimated to be about 2.1 eV [2]. This observed absorption edge of the synthesized film clearly indicates that the synthesized BFO is of semiconducting nature with a band gap about 2.1 eV. Figure S3. FTIR absorption spectra of thin film of BiFeO3 subscript gel (a) before and (b) after annealing at 350 °C for 3 h. Green, blue and magenta boxes represents region related to modes of Fe-O, C-N/C-O/NO3 and H–O–H bonds. The FTIR spectrum of BFO thin film collected on (frequency range from 400 to 3000 cm-1) sample before annealing show a strong peak at ∼460 cm-1 due to the Fe–O stretching and bending vibration which confirms formation of metal-oxygen bond2. In addition to this, absorption bands such as C–N (1,037 cm-1) vibration, stretching vibration band of NO3 ions and carbonate groups appeared at 1320, 914 and 730 cm-1, respectively [3]. These peaks seen to disappear after annealing the film at 350 °C for 3 h (Fig. S3(b)) indicating decomposition of side-chain groups. Moreover, strong absorptive peaks in the frequency range from 400-600 cm-1 are described to the Fe-O stretching and O–Fe–O bending vibration, which indicates formation of octahedra FeO6 of the perovskite structure4. The Fe-O bonding shows metal-oxide bonding which describes the characteristics of material like perovskite structure. Thus, FTIR study confirms the formation of perovskite structure of as-prepared BiFeO3. Figure S4. (a) SEM image and (b) EDS pattern of BFO thin film on Al substrate. The SEM image show nearly flat crack free BFO film surface. The EDS spectrum of BFO thin film on Al substrate is shown in Fig. S4(b). The spectrum collected on the film show characteristics emission lines for Bi Mαand Fe Lα line at E = 2.422 and 0.705 keV, respectively. Along with this, only two extra emission lines for Al Kα and Pt Mα were also observed (Al-substrate and Pt-a conductive coating on the sample). The EDS data confirms high purity of the synthesized BFO thin film. |
Please note: The publisher is not responsible for the content or functionality of any supporting information supplied by the authors. Any queries (other than missing content) should be directed to the corresponding author for the article.
References
- 1 T. W. Hickmott, J. Appl. Phys. 33, 2669 ( 1962).
- 2 G. Dearnaley, A. M. Stoneham and D. V. Morgan, Rep. Prog. Phys. 33, 1129 ( 1970).
- 3 A. Beck, J. G. Bednorz, J. G. Gerber, C. Rossel and D. Widmer, Appl. Phys. Lett. 77, 139 ( 2000).
- 4 D. B. Strukov, G. S. Snider, D. R. Stewart and R. S. Williams, Nature 453, 80 ( 2008).
- 5 A. Sawa, Mater. Today 11, 28 ( 2008).
- 6 R. Waser, R. Dittmann, G. Staikov and K. Szot, Adv. Mater. 21, 2632 ( 2009).
- 7 T. Yanagida, K. Nagashima, K. Oka, M. Kanai, A. Klamchuen, B. H. Park and T. Kawai, Nature Sci. Rep. 3, 1657 ( 2013).
- 8 T. Choi, S. Lee, Y. J. Choi, V. Kiryukhin and S. W. Cheong, Science 63, 324 ( 2009).
- 9 A. Rana, H. Lu, K. Bogle, Q. Zhang, R. Vasudevan, V. Thakare, A. Gruverman, S. Ogale and N. Valanoor, Adv. Funct. Mater. 24, 3962 ( 2014).
- 10 A. Tsurumaki, H. Yamada and A. Sawa, Adv. Funct. Mater. 22, 1040 ( 2012).
- 11 G. Catalan and J. F. Scott, Adv. Mater. 21, 2463 ( 2009).
- 12 J. Kreisel, M. Alexe and P. A. Thomas, Nature Mater. 11, 260 ( 2012).
- 13 S. Y. Yang, J. Seidel, S. J. Byrnes, P. Shafer, C. H. Yang, M. D. Rossell, P. Yu, Y. H. Chu, J. F. Scott, J. W. Ager, L. W. Martin and R. Ramesh, Nature Nanotechnol. 5, 143 ( 2010).
- 14 R. Guo, L. You, Y. Zhou, Z. S. Lim, X. Zou, L. Chen, R. Ramesh and J. Wang, Nature Commun. 4, 1990 ( 2013).
- 15 B. Chen, M. Li, Y. Liu, Z. Zuo, F. Zhuge, Q. F. Zhan and R. W. Li, Nanotechnology 22, 195201 ( 2011).
- 16 H. Y. Peng, G. P. Li, J. Y. Ye, Z. P. Wei, Z. Zhang, D. D. Wang, G. Z. Xing and T. Wu, Appl. Phys. Lett. 96, 192113 ( 2010).
- 17 S. Y. Yang, L. W. Martin, S. J. Byrnes, T. E. Conry, S. R. Basu, D. Paran, L. Reichertz, L. Ihlefeld, C. Adamo, A. Melville, Y. H. Chu, C. H. Yang, J. L. Musfeldt, D. G. Schlom, J. W. Ager, and F R. S Ramesh, Appl. Phys. Lett. 95, 062909 ( 2009).
- 18 L. Pintilie, C. Dragoi, Y. H. Chu, L. W. Martin, R. Ramesh and M. Alexe, Appl. Phys. Lett. 94, 232902 ( 2009).
- 19 S. R. Basu, L. W. Martin, Y. H. Chu, M. Gajek, R. Ramesh, R. C. Rai, X. Xu and J. L. Musfeldt, Appl. Phys. Lett. 92, 091905 ( 2008).
- 20 H. Yang, Y. Q. Wang, H. Wang and Q. X. Jia, Appl. Phys. Lett. 96, 012909 ( 2010).