Volume 203, Issue 7 pp. 1744-1748
Original Paper

Strain and microstructure in Fe-doped GaN layers grown by low pressure metalorganic vapour phase epitaxy

M. Azize

M. Azize

LUMILOG, 2720 Chemin Saint Bernard, Les Moulins, 06220 Vallauris, France

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M. Leroux

M. Leroux

CRHEA-CNRS, rue Bernard Grégory, Parc de Sophia Antipolis, 06560 Valbonne, France

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M. Laugt

M. Laugt

CRHEA-CNRS, rue Bernard Grégory, Parc de Sophia Antipolis, 06560 Valbonne, France

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P. Gibart

P. Gibart

CRHEA-CNRS, rue Bernard Grégory, Parc de Sophia Antipolis, 06560 Valbonne, France

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Z. Bougrioua

Z. Bougrioua

CRHEA-CNRS, rue Bernard Grégory, Parc de Sophia Antipolis, 06560 Valbonne, France

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First published: 18 May 2006
Citations: 9

Abstract

In order to get semi-insulating GaN layers with a low dislocation density on sapphire, two kinds of Fe doping were explored by low pressure metalorganic vapour phase epitaxy (LP-MOVPE): the modulation doping (MD) and the continuous doping (CD). The high crystalline quality and the semi-insulating character are obtained in the case of the Fe-MD layers. The effect of Fe doping on the strain was investigated in both kind of layers (MD and CD) by X-ray diffraction, photoluminescence and reflectivity. The lattice parameters are functions of the iron doping level, whatever the doping mode. (© 2006 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)

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