Volume 52, Issue 49 pp. 12838-12842
Communication

XeF2/Fluoride Acceptors as Versatile One-Electron Oxidants

Dr. Helmut Poleschner

Corresponding Author

Dr. Helmut Poleschner

Institut für Chemie und Biochemie, Anorganische und Analytische Chemie, Freie Universität Berlin, Fabeckstrasse 34–36, 14195 Berlin (Germany)

Institut für Chemie und Biochemie, Anorganische und Analytische Chemie, Freie Universität Berlin, Fabeckstrasse 34–36, 14195 Berlin (Germany)===Search for more papers by this author
Prof. Dr. Konrad Seppelt

Prof. Dr. Konrad Seppelt

Institut für Chemie und Biochemie, Anorganische und Analytische Chemie, Freie Universität Berlin, Fabeckstrasse 34–36, 14195 Berlin (Germany)

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First published: 11 October 2013
Citations: 42

We thank the Deutsche Forschungsgemeinschaft (Project PO 1503/1) and the Fonds der Chemischen Industrie for the support of this work, and Stefan Ellrodt for the synthesis of (Et3Si+)2 B12Cl122−.

Graphical Abstract

No phlogiston but xenon is released when XeF2/F acceptors act as new one-electron oxidants. F acceptors are Lewis acids BF3, B(C6F5)3, and Al{OC(CF3)3}3, and silyl derivatives TfOSiMe3, Tf2NSiMe3, Me3Si+ B(C6F5)4, and Me3Si+ CHB11Cl11. The anions BF4, TfO, Tf2N, FB(C6F5)3, FAl{OC(CF3)3}3, B(C6F5)4, or CHB11Cl11 can be introduced into oxidation products of R2E2 (E=S, Se, Te), [FeCp2], [(FeCpS)4], tetrathiafulvalene, thianthrene, and (2,4-Br2C6H3)3N.

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