Volume 69, Issue 5 pp. 669-678
Properties, Dynamics, and Electronic Structure of Atoms and Molecules

Stability of oxygen anions and hydrogen abstraction from methane on reduced SnO2 (110) surface

Yoichi Yamaguchi

Corresponding Author

Yoichi Yamaguchi

Research Institute of Innovative Technology for the Earth, 9-2, Kizugawadai, Kizu-cho, Soraku-gun, Kyoto 619-0292, Japan

Kansai Research Institute, Computational Sciences Laboratory, Information Communication Research Center, Kyoto Research Park 17, Chudoji Minami-machi, Shimogyo-ku, Kyoto 600-8813, JapanSearch for more papers by this author
Yosuke Nagasawa

Yosuke Nagasawa

Research Institute of Innovative Technology for the Earth, 9-2, Kizugawadai, Kizu-cho, Soraku-gun, Kyoto 619-0292, Japan

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Akinori Murakami

Akinori Murakami

Research Institute of Innovative Technology for the Earth, 9-2, Kizugawadai, Kizu-cho, Soraku-gun, Kyoto 619-0292, Japan

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Kenji Tabata

Kenji Tabata

Research Institute of Innovative Technology for the Earth, 9-2, Kizugawadai, Kizu-cho, Soraku-gun, Kyoto 619-0292, Japan

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Abstract

The stability of oxygen anions and the hydrogen abstraction from methane on a reduced SnO2 (110) crystal surface have been studied theoretically using a point-charge model. The geometric and electronic structures for the present molecules are calculated by means of a hybrid Hartree–Fock/density functional method at the B3LYP/6-311+G(3df, 3pd) level of theory. The calculations of the energies on the point-charge model are performed using these optimized geometries. It is found that a low concentration of the active oxygen species O and O2 is expected on the reduced SnO2 surface. The activation energies for the abstraction of hydrogen atom from methane on the reduced SnO2 surface are obtained: 12 kcal/mol for O species and more than 48 kcal/mol for O2 species, indicating that O species on the surface is the main active center for the dissociation of a C(SINGLE BOND)H bond of methane, which is in agreement with the other oxide catalysts. © 1998 John Wiley & Sons, Inc. Int J Quant Chem 69: 669–678, 1998

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