Initiated-Chemical Vapor Deposition of Polymer Thin Films: Unexpected Two-Regime Growth
Laetitia Bonnet
Université Grenoble Alpes, 38000 Grenoble, France
CEA, LETI, MINATEC Campus, 38054 Grenoble, France
Université de Lyon, Univ Lyon 1, CPE Lyon, CNRS, UMR 5265, C2P2 (Chemistry, Catalysis, Polymers & Processes), Team LCPP, Bat 308F, 43 Bd du 11 Novembre 1918, 69616 Villeurbanne, France
Search for more papers by this authorBruce Altemus
US-Technology Development Center, TEL Technology Center, America, LLC, 255 Fuller RoadSuite 214, Albany, NY, 12203 USA
Search for more papers by this authorRiccardo Scarazzini
Université Grenoble Alpes, 38000 Grenoble, France
CEA, LETI, MINATEC Campus, 38054 Grenoble, France
Search for more papers by this authorMarc Veillerot
Université Grenoble Alpes, 38000 Grenoble, France
CEA, LETI, MINATEC Campus, 38054 Grenoble, France
Search for more papers by this authorFranck D'Agosto
Université de Lyon, Univ Lyon 1, CPE Lyon, CNRS, UMR 5265, C2P2 (Chemistry, Catalysis, Polymers & Processes), Team LCPP, Bat 308F, 43 Bd du 11 Novembre 1918, 69616 Villeurbanne, France
Search for more papers by this authorJacques Faguet
US-Technology Development Center, TEL Technology Center, America, LLC2400 Grove Blvd., Austin, TX, 78741 USA
Search for more papers by this authorCorresponding Author
Vincent Jousseaume
Université Grenoble Alpes, 38000 Grenoble, France
CEA, LETI, MINATEC Campus, 38054 Grenoble, France
E-mail: [email protected]Search for more papers by this authorLaetitia Bonnet
Université Grenoble Alpes, 38000 Grenoble, France
CEA, LETI, MINATEC Campus, 38054 Grenoble, France
Université de Lyon, Univ Lyon 1, CPE Lyon, CNRS, UMR 5265, C2P2 (Chemistry, Catalysis, Polymers & Processes), Team LCPP, Bat 308F, 43 Bd du 11 Novembre 1918, 69616 Villeurbanne, France
Search for more papers by this authorBruce Altemus
US-Technology Development Center, TEL Technology Center, America, LLC, 255 Fuller RoadSuite 214, Albany, NY, 12203 USA
Search for more papers by this authorRiccardo Scarazzini
Université Grenoble Alpes, 38000 Grenoble, France
CEA, LETI, MINATEC Campus, 38054 Grenoble, France
Search for more papers by this authorMarc Veillerot
Université Grenoble Alpes, 38000 Grenoble, France
CEA, LETI, MINATEC Campus, 38054 Grenoble, France
Search for more papers by this authorFranck D'Agosto
Université de Lyon, Univ Lyon 1, CPE Lyon, CNRS, UMR 5265, C2P2 (Chemistry, Catalysis, Polymers & Processes), Team LCPP, Bat 308F, 43 Bd du 11 Novembre 1918, 69616 Villeurbanne, France
Search for more papers by this authorJacques Faguet
US-Technology Development Center, TEL Technology Center, America, LLC2400 Grove Blvd., Austin, TX, 78741 USA
Search for more papers by this authorCorresponding Author
Vincent Jousseaume
Université Grenoble Alpes, 38000 Grenoble, France
CEA, LETI, MINATEC Campus, 38054 Grenoble, France
E-mail: [email protected]Search for more papers by this authorAbstract
Initiated-chemical vapor deposition (iCVD) is a very promising technique which has demonstrated the ability to deposit a large variety of polymers that can be integrated in micro-nanotechnology applications. However, studies on the underlying growth mechanisms responsible for the formation of these thin films remain scarce in the literature. This work shows that the iCVD growth follows surprisingly two regimes: in the first stage of the growth, the deposition rate is relatively slow then increases with the deposition time until a linear growth is reached. The presence of these two growth regimes can be interpreted by taking into account, as the iCVD growth progresses, that the synthesized polymer chains help the monomer adsorption on the substrate which locally increases the concentration of monomers available for the polymerization and thus the growth rate. This increase of the local concentration of monomer consistently correlates with the formation of polymer chains with higher molar mass.
Conflict of Interest
The authors declare no conflict of interest.
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