Volume 50, Issue 5 pp. 1376-1381
research papers

On the onset of strain relaxation in the Al0.45Ga0.55As/InxGa1−xAs active region in quantum cascade laser structures

Iwona Sankowska

Corresponding Author

Iwona Sankowska

Institute of Electron Technology, Al. Lotników 32/46, Warsaw, 02-668, Poland

Iwona Sankowska, e-mail: [email protected]Search for more papers by this author
Piotr Gutowski

Piotr Gutowski

Institute of Electron Technology, Al. Lotników 32/46, Warsaw, 02-668, Poland

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Agata Jasik

Agata Jasik

Institute of Electron Technology, Al. Lotników 32/46, Warsaw, 02-668, Poland

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Krzysztof Czuba

Krzysztof Czuba

Institute of Electron Technology, Al. Lotników 32/46, Warsaw, 02-668, Poland

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Jerzy Dabrowski

Jerzy Dabrowski

Institute of Physics, Polish Academy of Sciences, Al. Lotników 32/46, Warsaw, 02-668, Poland

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Maciej Bugajski

Maciej Bugajski

Institute of Electron Technology, Al. Lotników 32/46, Warsaw, 02-668, Poland

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First published: 14 September 2017

Abstract

The Al0.45Ga0.55As/InxGa1−xAs active regions in quantum cascade laser structures grown on (001) GaAs substrates were investigated using the high-resolution X-ray diffraction method. The onset of the strain relaxation process has been studied. Reciprocal-space mapping showed that diffuse scattering is visible in the early stage of relaxation for the structure with x = 2.64% in the InxGa1−xAs layers. It has been proved that the diffuse scattering is the result of misfit dislocations generated by partial relaxation of the structures. The integration of the diffuse scattering has enabled determination of the dislocation density.

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