Volume 206, Issue 8 pp. 1740-1743
Original Paper

Heteroepitaxial growth of lattice matched films on GaAs(001)

B. Jenichen

Corresponding Author

B. Jenichen

Paul-Drude-Institut für Festkörperelektronik, Hausvogteiplatz 5–7, 10117 Berlin, Germany

Phone: +49-30-20377324, Fax: +49-30-20377201Search for more papers by this author
V. M. Kaganer

V. M. Kaganer

Paul-Drude-Institut für Festkörperelektronik, Hausvogteiplatz 5–7, 10117 Berlin, Germany

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R. Shayduk

R. Shayduk

Paul-Drude-Institut für Festkörperelektronik, Hausvogteiplatz 5–7, 10117 Berlin, Germany

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W. Braun

W. Braun

Paul-Drude-Institut für Festkörperelektronik, Hausvogteiplatz 5–7, 10117 Berlin, Germany

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A. Trampert

A. Trampert

Paul-Drude-Institut für Festkörperelektronik, Hausvogteiplatz 5–7, 10117 Berlin, Germany

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First published: 27 July 2009
Citations: 6

Abstract

The thin films of lattice matched materials Fe3Si and Ge are grown on GaAs(001) by molecular beam epitaxy and studied by grazing incidence X-ray diffraction. In the initial phase of Fe3Si growth, the surface is rough due to a formation of small islands. Two-dimensional layer-by-layer growth arises later on. Germanium grows on GaAs in a layer-by-layer growth mode right from the beginning. A substantial improvement of the surface smoothness of the Ge film during the growth is found.

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