Semiconductor Doping
First published: 27 December 1999
Abstract
The sections in this article are
- 1 Formalism of Diffusion
- 2 Realization of the Diffusion Processes
- 3 Atomic Models of Diffusion
- 4 Diffusion of Impurities
- 5 The Role of Oxidation and Nitridation During Diffusion
- 6 The Role of Substrate Orientation in Diffusion
- 7 Diffusion in Polycrystalline and Amorphous Silicon
- 8 Masking Properties of Oxides
- 9 Dopant Diffusion in Silicides
- 10 Stress and Diffusion
- 11 Characterization of Doped Layers
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