Volume 12, Issue S2 pp. S141-S142
Letter

High-aspect-ratio aluminum-doped zinc oxide nanomechanical resonator

Nguyen Van Toan

Corresponding Author

Nguyen Van Toan

Non-member

Graduate School of Engineering, Tohoku University, 6-6-01 Aramaki-Aza-Aoba, Aoba-ku,, Sendai, 980-8579 Japan

Correspondence to: Nguyen Van Toan. E-mail: [email protected]Search for more papers by this author
Naoki Inomata

Naoki Inomata

Member

Graduate School of Engineering, Tohoku University, 6-6-01 Aramaki-Aza-Aoba, Aoba-ku,, Sendai, 980-8579 Japan

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Takahito Ono

Takahito Ono

Senior Member

Graduate School of Engineering, Tohoku University, 6-6-01 Aramaki-Aza-Aoba, Aoba-ku,, Sendai, 980-8579 Japan

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First published: 08 December 2017

Abstract

This paper reports on the patterning of a high-aspect-ratio aluminum-doped zinc oxide (AZO) capacitive resonator based on the combination of the deep reactive ion etching (deep RIE) and atomic layer deposition (ALD) processes. The suspended AZO capacitive resonator is successfully demonstrated. Its resonant frequency is observed at 10.4 kHz with a quality factor (Q factor) of approximately 500 in a vacuum chamber.

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