Towards All-Organic Field-Effect Transistors by Additive Soft Lithography†
Dana Alina Serban
CeRMiN, Université Catholique de Louvain Louvain-la Neuve 1348 (Belgium)
Search for more papers by this authorPierpaolo Greco
CNR, Istituto per lo Studio dei Materiali Nanostrutturati (ISMN) Via P. Gobetti 101, Bologna 40129 (Italy)
Search for more papers by this authorSorin Melinte
CeRMiN, Université Catholique de Louvain Louvain-la Neuve 1348 (Belgium)
Search for more papers by this authorAlexandru Vlad
CeRMiN, Université Catholique de Louvain Louvain-la Neuve 1348 (Belgium)
Search for more papers by this authorConstantin Augustin Dutu
CeRMiN, Université Catholique de Louvain Louvain-la Neuve 1348 (Belgium)
Search for more papers by this authorStefano Zacchini
Dipartimento di Chimica Fisica e Inorganica Università di Bologna, Bologna 40136 (Italy)
Search for more papers by this authorMaria Carmela Iapalucci
Dipartimento di Chimica Fisica e Inorganica Università di Bologna, Bologna 40136 (Italy)
Search for more papers by this authorFabio Biscarini
CNR, Istituto per lo Studio dei Materiali Nanostrutturati (ISMN) Via P. Gobetti 101, Bologna 40129 (Italy)
Search for more papers by this authorCorresponding Author
Massimiliano Cavallini
CNR, Istituto per lo Studio dei Materiali Nanostrutturati (ISMN) Via P. Gobetti 101, Bologna 40129 (Italy)
CNR, Istituto per lo Studio dei Materiali Nanostrutturati (ISMN) Via P. Gobetti 101, Bologna 40129 (Italy).Search for more papers by this authorDana Alina Serban
CeRMiN, Université Catholique de Louvain Louvain-la Neuve 1348 (Belgium)
Search for more papers by this authorPierpaolo Greco
CNR, Istituto per lo Studio dei Materiali Nanostrutturati (ISMN) Via P. Gobetti 101, Bologna 40129 (Italy)
Search for more papers by this authorSorin Melinte
CeRMiN, Université Catholique de Louvain Louvain-la Neuve 1348 (Belgium)
Search for more papers by this authorAlexandru Vlad
CeRMiN, Université Catholique de Louvain Louvain-la Neuve 1348 (Belgium)
Search for more papers by this authorConstantin Augustin Dutu
CeRMiN, Université Catholique de Louvain Louvain-la Neuve 1348 (Belgium)
Search for more papers by this authorStefano Zacchini
Dipartimento di Chimica Fisica e Inorganica Università di Bologna, Bologna 40136 (Italy)
Search for more papers by this authorMaria Carmela Iapalucci
Dipartimento di Chimica Fisica e Inorganica Università di Bologna, Bologna 40136 (Italy)
Search for more papers by this authorFabio Biscarini
CNR, Istituto per lo Studio dei Materiali Nanostrutturati (ISMN) Via P. Gobetti 101, Bologna 40129 (Italy)
Search for more papers by this authorCorresponding Author
Massimiliano Cavallini
CNR, Istituto per lo Studio dei Materiali Nanostrutturati (ISMN) Via P. Gobetti 101, Bologna 40129 (Italy)
CNR, Istituto per lo Studio dei Materiali Nanostrutturati (ISMN) Via P. Gobetti 101, Bologna 40129 (Italy).Search for more papers by this authorWe thank Pablo Stoliar, Francesco Borgatti, and Radu Popa for their help and suggestions. This work was partly supported by ESF-EURYI DYMOT, Belgian F.R.S.-FNRS, and Wallonia Region.
Graphical Abstract
Soft-processed organic transistors that exceed in performance compared to their counterparts made via standard microfabrication are demonstrated. The image shows the detail of an optical picture of the P3HT–Pt interface of an additively soft-patterned transistor, with Pt electrodes defined by MIMIC and P3HT stripes obtained by LCW.
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