Volume 9, Issue 3-4 pp. 605-608
ICNS-9 – Contributed Article

Epitaxial growth and properties of GdN, EuN and SmN thin films

Franck Natali

Corresponding Author

Franck Natali

MacDiarmid Institute of Advanced Materials and Nanotechnology, School of Chemical and Physical Sciences, Victoria University of Wellington, P.O. Box 600, Wellington, New Zealand

Phone: +64 4463 5964, Fax: +64 4463 5237Search for more papers by this author
Bart Ludbrook

Bart Ludbrook

MacDiarmid Institute of Advanced Materials and Nanotechnology, School of Chemical and Physical Sciences, Victoria University of Wellington, P.O. Box 600, Wellington, New Zealand

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Jules Galipaud

Jules Galipaud

MacDiarmid Institute of Advanced Materials and Nanotechnology, School of Chemical and Physical Sciences, Victoria University of Wellington, P.O. Box 600, Wellington, New Zealand

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Natalie Plank

Natalie Plank

MacDiarmid Institute of Advanced Materials and Nanotechnology, School of Chemical and Physical Sciences, Victoria University of Wellington, P.O. Box 600, Wellington, New Zealand

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Simon Granville

Simon Granville

MacDiarmid Institute of Advanced Materials and Nanotechnology, School of Chemical and Physical Sciences, Victoria University of Wellington, P.O. Box 600, Wellington, New Zealand

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Andrew Preston

Andrew Preston

MacDiarmid Institute of Advanced Materials and Nanotechnology, School of Chemical and Physical Sciences, Victoria University of Wellington, P.O. Box 600, Wellington, New Zealand

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Bin Le Do

Bin Le Do

MacDiarmid Institute of Advanced Materials and Nanotechnology, School of Chemical and Physical Sciences, Victoria University of Wellington, P.O. Box 600, Wellington, New Zealand

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Jan Richter

Jan Richter

MacDiarmid Institute of Advanced Materials and Nanotechnology, School of Chemical and Physical Sciences, Victoria University of Wellington, P.O. Box 600, Wellington, New Zealand

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Ian Farrell

Ian Farrell

MacDiarmid Institute of Advanced Materials and Nanotechnology, University of Canterbury, Private Bag 4800, Christchurch 8140, New Zealand

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Roger Reeves

Roger Reeves

MacDiarmid Institute of Advanced Materials and Nanotechnology, University of Canterbury, Private Bag 4800, Christchurch 8140, New Zealand

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Steve Durbin

Steve Durbin

MacDiarmid Institute of Advanced Materials and Nanotechnology, University of Canterbury, Private Bag 4800, Christchurch 8140, New Zealand

Department of Physics, University of Buffalo, 239 Fronczak Hall, Buffalo, NY 14260-1500, USA

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Joe Trodahl

Joe Trodahl

MacDiarmid Institute of Advanced Materials and Nanotechnology, School of Chemical and Physical Sciences, Victoria University of Wellington, P.O. Box 600, Wellington, New Zealand

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Ben Ruck

Ben Ruck

MacDiarmid Institute of Advanced Materials and Nanotechnology, School of Chemical and Physical Sciences, Victoria University of Wellington, P.O. Box 600, Wellington, New Zealand

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First published: 07 December 2011
Citations: 23

Abstract

This paper contains a summary of selected aspects of the epitaxial growth of rare-earth nitride thin films and the recent progress achieved in this field. The discussion is focussed on GdN, SmN, EuN compounds grown by both pulsed laser deposition and molecular beam epitaxy on different substrates including YSZ (001), c-plane (0001) AlN and GaN. While a N2 plasma cell is used as a nitrogen source for growing EuN, we take advantage of the catalytic breakdown of molecular nitrogen by rare-earth atoms to grow GdN and SmN in the absence of activated N2. The structural, magnetic and transport properties of the thin films are assessed by reflection high-energy electron diffraction, x-ray diffraction, Hall Effect, temperature-dependent magnetization and resistivity. (© 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)

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