1D Atomic Defect Tunnel Structure of Oxygen-Deficient Tungsten Oxide Epitaxial Films and Its Redox Device Applications
Corresponding Author
Gowoon Kim
Graduate School of Information Science and Technology, Hokkaido University, Sapporo, 060-0814 Japan
Search for more papers by this authorCorresponding Author
Hiromichi Ohta
Research Institute for Electronic Science, Hokkaido University, Sapporo, 001-0020 Japan
Search for more papers by this authorCorresponding Author
Gowoon Kim
Graduate School of Information Science and Technology, Hokkaido University, Sapporo, 060-0814 Japan
Search for more papers by this authorCorresponding Author
Hiromichi Ohta
Research Institute for Electronic Science, Hokkaido University, Sapporo, 001-0020 Japan
Search for more papers by this authorAbstract
Transition metal oxides (TMOs) have potential as active materials for information storage devices due to their diverse structural–chemical–physical properties. Among the many TMOs, tungsten oxide (WO x ) is a promising candidate because the oxygen concentration can control the crystal structure. The 1D atomic defect tunnel structure of oxygen-deficient WO x is a suitable platform to realize storage devices. Recently, the relationship between the crystal structure and the optical–electrical–thermal transport properties of WO x using high-quality epitaxial films has been elucidated and an electrochemical redox device using WO x films with a 1D atomic defect tunnel structure has been demonstrated using this relationship. Herein, the 1D atomic defect tunnel structure of oxygen-deficient WO x epitaxial films and its redox device applications are reviewed based on these efforts.
Conflict of Interest
The authors declare no conflicts of interest.
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