Volume 219, Issue 21 2200058
Review

1D Atomic Defect Tunnel Structure of Oxygen-Deficient Tungsten Oxide Epitaxial Films and Its Redox Device Applications

Gowoon Kim

Corresponding Author

Gowoon Kim

Graduate School of Information Science and Technology, Hokkaido University, Sapporo, 060-0814 Japan

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Hiromichi Ohta

Corresponding Author

Hiromichi Ohta

Research Institute for Electronic Science, Hokkaido University, Sapporo, 001-0020 Japan

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First published: 23 August 2022

Abstract

Transition metal oxides (TMOs) have potential as active materials for information storage devices due to their diverse structural–chemical–physical properties. Among the many TMOs, tungsten oxide (WO x ) is a promising candidate because the oxygen concentration can control the crystal structure. The 1D atomic defect tunnel structure of oxygen-deficient WO x is a suitable platform to realize storage devices. Recently, the relationship between the crystal structure and the optical–electrical–thermal transport properties of WO x using high-quality epitaxial films has been elucidated and an electrochemical redox device using WO x films with a 1D atomic defect tunnel structure has been demonstrated using this relationship. Herein, the 1D atomic defect tunnel structure of oxygen-deficient WO x epitaxial films and its redox device applications are reviewed based on these efforts.

Conflict of Interest

The authors declare no conflicts of interest.

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