Understanding Microwave Surface-Wave Sustained Plasmas at Intermediate Pressure by 2D Modeling and Experiments
Corresponding Author
Violeta Georgieva
Université Libre de Bruxelles, École Polytechnique de Bruxelles, Service 4MAT, av. F.D. Roosevelt 50-CP 165/63, 1050, Brussels, Belgium
Department of Chemistry, Research Group PLASMANT, University of Antwerp, Universiteitsplein 1, B-2610, Wilrijk-Antwerp, Belgium
Search for more papers by this authorAntonin Berthelot
Department of Chemistry, Research Group PLASMANT, University of Antwerp, Universiteitsplein 1, B-2610, Wilrijk-Antwerp, Belgium
Search for more papers by this authorTiago Silva
Université de Mons, ChIPS, av. Nicolas Copernic 1, 7000, Mons, Belgium
Search for more papers by this authorStanimir Kolev
Department of Chemistry, Research Group PLASMANT, University of Antwerp, Universiteitsplein 1, B-2610, Wilrijk-Antwerp, Belgium
Faculty of Physics, Sofia University, Blvd “James Bourchier” 5, 1164, Sofia, Bulgaria
Search for more papers by this authorWouter Graef
Department of Applied Physics, Research Group EPG, Eindhoven University of Technology, P.O. Box 513, 5600 MB, Eindhoven, the Netherlands
Search for more papers by this authorNikolay Britun
Université de Mons, ChIPS, av. Nicolas Copernic 1, 7000, Mons, Belgium
Search for more papers by this authorGuoxing Chen
Université Libre de Bruxelles, École Polytechnique de Bruxelles, Service 4MAT, av. F.D. Roosevelt 50-CP 165/63, 1050, Brussels, Belgium
Université de Mons, ChIPS, av. Nicolas Copernic 1, 7000, Mons, Belgium
Search for more papers by this authorJoost van der Mullen
Université Libre de Bruxelles, École Polytechnique de Bruxelles, Service 4MAT, av. F.D. Roosevelt 50-CP 165/63, 1050, Brussels, Belgium
Search for more papers by this authorThomas Godfroid
Materia Nova Research Center, av. Nicolas Copernic 1, 7000, Mons, Belgium
Search for more papers by this authorDiana Mihailova
Department of Applied Physics, Research Group EPG, Eindhoven University of Technology, P.O. Box 513, 5600 MB, Eindhoven, the Netherlands
Search for more papers by this authorJan van Dijk
Department of Applied Physics, Research Group EPG, Eindhoven University of Technology, P.O. Box 513, 5600 MB, Eindhoven, the Netherlands
Search for more papers by this authorRony Snyders
Université de Mons, ChIPS, av. Nicolas Copernic 1, 7000, Mons, Belgium
Materia Nova Research Center, av. Nicolas Copernic 1, 7000, Mons, Belgium
Search for more papers by this authorAnnemie Bogaerts
Department of Chemistry, Research Group PLASMANT, University of Antwerp, Universiteitsplein 1, B-2610, Wilrijk-Antwerp, Belgium
Search for more papers by this authorMarie-Paule Delplancke-Ogletree
Université Libre de Bruxelles, École Polytechnique de Bruxelles, Service 4MAT, av. F.D. Roosevelt 50-CP 165/63, 1050, Brussels, Belgium
Search for more papers by this authorCorresponding Author
Violeta Georgieva
Université Libre de Bruxelles, École Polytechnique de Bruxelles, Service 4MAT, av. F.D. Roosevelt 50-CP 165/63, 1050, Brussels, Belgium
Department of Chemistry, Research Group PLASMANT, University of Antwerp, Universiteitsplein 1, B-2610, Wilrijk-Antwerp, Belgium
Search for more papers by this authorAntonin Berthelot
Department of Chemistry, Research Group PLASMANT, University of Antwerp, Universiteitsplein 1, B-2610, Wilrijk-Antwerp, Belgium
Search for more papers by this authorTiago Silva
Université de Mons, ChIPS, av. Nicolas Copernic 1, 7000, Mons, Belgium
Search for more papers by this authorStanimir Kolev
Department of Chemistry, Research Group PLASMANT, University of Antwerp, Universiteitsplein 1, B-2610, Wilrijk-Antwerp, Belgium
Faculty of Physics, Sofia University, Blvd “James Bourchier” 5, 1164, Sofia, Bulgaria
Search for more papers by this authorWouter Graef
Department of Applied Physics, Research Group EPG, Eindhoven University of Technology, P.O. Box 513, 5600 MB, Eindhoven, the Netherlands
Search for more papers by this authorNikolay Britun
Université de Mons, ChIPS, av. Nicolas Copernic 1, 7000, Mons, Belgium
Search for more papers by this authorGuoxing Chen
Université Libre de Bruxelles, École Polytechnique de Bruxelles, Service 4MAT, av. F.D. Roosevelt 50-CP 165/63, 1050, Brussels, Belgium
Université de Mons, ChIPS, av. Nicolas Copernic 1, 7000, Mons, Belgium
Search for more papers by this authorJoost van der Mullen
Université Libre de Bruxelles, École Polytechnique de Bruxelles, Service 4MAT, av. F.D. Roosevelt 50-CP 165/63, 1050, Brussels, Belgium
Search for more papers by this authorThomas Godfroid
Materia Nova Research Center, av. Nicolas Copernic 1, 7000, Mons, Belgium
Search for more papers by this authorDiana Mihailova
Department of Applied Physics, Research Group EPG, Eindhoven University of Technology, P.O. Box 513, 5600 MB, Eindhoven, the Netherlands
Search for more papers by this authorJan van Dijk
Department of Applied Physics, Research Group EPG, Eindhoven University of Technology, P.O. Box 513, 5600 MB, Eindhoven, the Netherlands
Search for more papers by this authorRony Snyders
Université de Mons, ChIPS, av. Nicolas Copernic 1, 7000, Mons, Belgium
Materia Nova Research Center, av. Nicolas Copernic 1, 7000, Mons, Belgium
Search for more papers by this authorAnnemie Bogaerts
Department of Chemistry, Research Group PLASMANT, University of Antwerp, Universiteitsplein 1, B-2610, Wilrijk-Antwerp, Belgium
Search for more papers by this authorMarie-Paule Delplancke-Ogletree
Université Libre de Bruxelles, École Polytechnique de Bruxelles, Service 4MAT, av. F.D. Roosevelt 50-CP 165/63, 1050, Brussels, Belgium
Search for more papers by this authorAbstract
An Ar plasma sustained by a surfaguide wave launcher is investigated at intermediate pressure (200–2667 Pa). Two 2D self-consistent models (quasi-neutral and plasma bulk-sheath) are developed and benchmarked. The complete set of electromagnetic and fluid equations and the boundary conditions are presented. The transformation of fluid equations from a local reference frame, that is, moving with plasma or when the gas flow is zero, to a laboratory reference frame, that is, accounting for the gas flow, is discussed. The pressure range is extended down to 80 Pa by experimental measurements. The electron temperature decreases with pressure. The electron density depends linearly on power, and changes its behavior with pressure depending on the product of pressure and radial plasma size.
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References
- 1 M. Moisan, A. Shivarova, A. W. Trivelpiece, Plasma Phys. 1982, 24, 1331.
- 2 M. Moisan, J. Pelletier (Eds.), Microwave Excited Plasmas, Elsevier, Amsterdam, the Netherlands 1992.
- 3 H. Schlüter, A. Shivarova, Phys. Rep. 2007, 443, 121.
- 4
Yu. A. Lebedev,
J. Phys.: Conf. Ser.
2010,
257, 012016.
10.1088/1742-6596/257/1/012016 Google Scholar
- 5 F. Normand, J. Marec, Ph. Leprince, A. Granier, Mater. Sci. Eng. A 1991, 139, 103.
- 6 R. Foest, E. Kindel, A. Ohl, M. Stieber, K.-D. Weltmann, Plasma Phys. Control. Fusion 2005, 47, B525.
- 7
D. Vinga Szabó,
S. Schlabach,
Inorganics
2014,
2, 468.
10.3390/inorganics2030468 Google Scholar
- 8 L. Zajíčková, O. Jašek, P. Synek, A. Obrusník, V. Kudrle, Conference Proceedings MD9 “Microwave Discharges: Fundamentals and Applications”. UCOPress, Cordoba 2015.
- 9 A. Dias, N. Bundaleski, E. Tatarova, F. M. Dias, M. Abrashev, U. Cvelbar, O. M. N. D. Teodoro, J. Henriques, J. Phys. D: Appl. Phys. 2016, 49, 055307.
- 10 H. Kokura, K. Nakamura, I. Ghanashev, H. Sugai, Jpn. J. Appl. Phys. 1999, 38, 5262.
- 11 M. Moisan, J. Barbeau, M.-C. Crevier, J. Pelletier, N. Philip, B. Saoudi, Pure Appl. Chem. 2002, 74, 349.
- 12 N. Philip, B. Saoudi, M. Moisan, J. Barbeau, J. Pelletier, IEEE Trans. Plasma Sci. 2002, 30, 1429.
- 13 J Ehlbeck, A Ohl, M Maaß, U Krohmann, T Neumann, Surf. Coat. Technol. 2003, 174–175, 493.
- 14 G. Fridman, G. Friedman, A. Gutsol, A. B. Shekhter, V. N. Vasilets, A. Fridman, Plasma Process. Polym 2008, 5, 503.
- 15 J. Heinlin, G. Morfill, M. Landthaler, W. Stolz, G. Isbary, J. L. Zimmermann, T. Shimizu, S. Karrer, J. Dtsch. Dermatol. Ges. 2010, 8, 968.
- 16 M. Baeva, M. Andrasch, J. Ehlbeck, D. Loffhagen, K.-D. Weltmann, J. Appl. Phys. 2014, 115, 143301.
- 17 S. Schermer, N. H. Bings, A. M. Bilgiç, R. Stonies, E. Voges, J. A. C. Broekaert, Spectrochim. Acta B 2003, 58, 1585.
- 18 A. R. Hoskinson, J. Hopwood, N. W. Bostrom, J. A. Crank, C. Harrison, J. Anal. At. Spectrom. 2011, 26, 1258.
- 19 Y. Kabouzi, M. Moisan, J. C. Rostaing, C. Trassy, D. Guérin, D. Kéroack, Z. Zakrzewski, J. Appl. Phys. 2003, 93, 9483.
- 20 Welzel, S.; Bongers, W. A.; Graswinckel, M. F.; van de Sanden, M. C. M., PS Gaseous Electronics Conference 2014, abstract #SF2.006 “CO2 dissociation in vortex-stabilized microwave plasmas”.
- 21 G. Chen, V. Georgieva, T. Godfroid, R. Snyders, M.-P. Delplancke-Ogletree, Appl. Catal. B-Environ. 2016, 190, 115.
- 22 A. W. Trivelpiece, R. W. Gould, J. Appl. Phys. 1959, 30, 1784.
- 23 M. Moisan, C. Beaudry, P. Leprince, Phys. Lett. 1974, 50A, 125.
- 24 Z. Zakrzewski, J. Phys. D: Appl. Phys. 1983, 16, 171.
- 25 C. M. Ferreira, J. Phys. D: Appl. Phys. 1983, 16, 1673.
- 26 C. Boisse-Laporte, A. Graniert, E. Dervisevic, P. Leprince, J. Marec, J. Phys. D: Appl. Phys. 1987, 20, 197.
- 27 C. M. Ferreira, M. Moisan, Phys. Scr. 1988, 38, 382.
- 28 Yu. M. Aliev, I. Ganashev, H. Schlüter, A. Shivarova, M. Zethoff, Plasma Sources Sci. Technol. 1994, 3, 216.
- 29
Yu. M. Aliev,
H. Schlüter,
A. Shivarova,
Guided-Wave-Produced Plasmas.
Springer-Verlag,
Berlin Heidelberg, Germany
2000.
10.1007/978-3-642-57060-5 Google Scholar
- 30 E. Mateev, I. Zhelyazkov, V. Atanassov, J. Appl. Phys. 1983, 54, 3049.
- 31 I. Zhelyazkov, E. Benova, J. Appl. Phys. 1989, 66, 1641.
- 32 E. Benova, I. Zhelyazkov, Phys. Scr. 1991, 43, 68.
- 33 C. M. Ferreira, J. Phys. D: Appl. Phys. 1989, 22, 705.
- 34 U. Kortshagen, H. Schlüter, A. Shivarova, J. Phys. D: Appl. Phys. 1991, 24, 1571.
- 35 L. L. Alves, G. Gousset, C. M. Ferreira, J. Phys. D: Appl. Phys. 1992, 25, 1713.
- 36 Ts. Petrova, E. Benova, G. Petrov, I. Zhelyazkov, Phys. Rev. E 1999, 60, 875.
- 37 J. Henriques, E. Tatarova, F. M. Dias, C. M. Ferreira, J. Appl. Phys. 2001, 90, 4921.
- 38 L. L. Alves, S. Letout, C. Boisse-Laporte, Phys. Rev. E 2009, 79, 016403.
- 39 G. M. Janssen, PhD Thesis, Eindhoven University of Technology, the Netherlands, October, 2000.
- 40 Y. Kabouzi, D. B. Graves, E. Castaños-Martínez, M. Moisan, Phys. Rev. E 2007, 75, 016402.
- 41 M. Jimenez-Diaz, E. A. D. Carbone, J. van Dijk, J. J. A. M. van der Mullen, J. Phys. D: Appl. Phys. 2012, 45, 335204.
- 42 S. Rahimi, M. Jimenez-Diaz, S. Hubner, E. H. Kemaneci, J. J. A. M. van der Mullen, J. van Dijk, J. Phys. D: Appl. Phys. 2014, 47, 125204.
- 43 Z. Zakrzewski, M. Moisan, V. M. M. Glaude, C. Beaudry, P. Leprince, Plasma Phys. 1977, 19, 77.
- 44 J. Margot-Chaker, M. Moisan, M. Chaker, V. M. M. Glaude, P. Lauque, J. Paraszczak, G. Sauvé, J. Appl. Phys. 1989, 66, 4134.
- 45 M. Moisan, Z. Zakrzewski, J. Phys. D: Appl. Phys. 1991, 24, 1025.
- 46 E Bloyet, P Leprince, M. Llamas Blasco, J Marec, Phys. Lett. A 1981, 83, 391.
- 47 T. Godfroid, J. P. Dauchot, M. Hecq, Surf. Coat. Technol. 2003, 174–175, 1276.
- 48 M. C. Garćıa, A. Rodero, A. Sola, A. Gamero, Spectrochim. Acta Part B 2000, 55, 1733.
- 49 C. Lao, A. Gamero, A. Sola, Ts. Petrova, E. Benova, G. M. Petrov, I. Zhelyazkov, J. Appl. Phys 2000, 87, 7652.
- 50 J. M. Palomares, E. Iordanova, E. M. van Veldhuizen, L. Baede, A. Gamero, A. Sola, J. J. A. M. van der Mullen, Spectrochim. Acta Part B 2010, 65, 225.
- 51 N. Britun, T. Godfroid, R. Snyders, Plasma Sources Sci. Technol. 2012, 21, 035007.
- 52 S. Hübner, N. Sadeghi, E. A. D. Carbone, J. J. A. M. van der Mullen, J. Appl. Phys 2013, 113, 143306.
- 53 L. D. Landau, E. M. Lifshiftz, Electrodynamics of Continuous Media. Pergamon Press, Oxford 1960.
- 54 G. J. M. Hagelaar, K. Hassouni, A. Gicquel, J. Appl. Phys. 2004, 96, 1819.
- 55 A. Sola, A. Gamero, J. Cotrino, V. Colomer, J. Phys. D: Appl. Phys. 1988, 21, 1112.
- 56 J. Cotrino, A. Gamero, A. Sola, V. Colomer, J. Phys. D: Appl. Phys. 1988, 21, 1377.
- 57 St. Kolev, A. Bogaerts, Plasma Sources Sci. Technol. 2015, 24, 015025.
- 58 J. B. Boffard, R. O. Jung, C. C. Lin, A. E. Wendt, Plasma Sources Sci. Technol. 2010, 19, 065001.
- 59 T. Silva, N. Britun, T. Godfroid, J. van der Mullen, R. Snyders, J. Appl. Phys. 2016, 119, 173302.
- 60 N. Britun, M. Gaillard, S. Oh, J. Han, J. Phys. D: Appl. Phys. 2007, 40, 5098.
- 61 G. M. Janssen, J. van Dijk, D. A. Benoy, M. A. Tas, K. T. A. L. Burm, W. J. Goedheer, J. A. M. van der Mullen, D. C. Schram, Plasma Sources Sci. Technol. 1999, 8, 1.
- 62 J. van Dijk, K. Peerenboom, M. Jimenez, D. Mihailova, J. van der Mullen, J. Phys. D: Appl. Phys. 2009, 42, 194012.
- 63The Plasimo Team, Homepage, https://plasimo.phys.tue.nl/ (accesses November, 2016).
- 64COMSOL Inc, Homepage, https://www.comsol.com (accessed November, 2016).
- 65 D. A. Benoy, PhD Thesis, Eindhoven University of Technology, the Netherlands, April 1993.
- 66 M. A. Liebermann, A. J. Lichtenberg, Principles of Plasma Discharges and Materials processing. Wiley, New York, USA 1994.
- 67 G. J. M. Hagelaar, L. C. Pitchford, Plasma Sources Sci. Technol. 2005, 14, 722.
- 68 M. Jimenez-Diaz, PhD Thesis, Eindhoven University of Technology, the Netherlands, June 2011.
- 69
J. A. Bittencourt,
Fundamentals of Plasma Physics.
Springer-Verlag,
New York, USA
2004.
10.1007/978-1-4757-4030-1 Google Scholar
- 70 V. E. Golant, A. P. Zhilinskii, I. E. Sakharov, Fundamentals of Plasma Physics. Wiley, New York, USA 1980.
- 71 M. Mitchner, C. H. Kruger, Partially Ionized Gases. Wiley, New York, USA 1973.
- 72 E. W. McDaniel, E. A. Mason, The Mobility and Diffusion of Ions in Gases. Wiley, Hoboken, NJ, USA 1973.
- 73 C. M. Ferreira, J. Loureiro, A. Ricard, J. Appl. Phys. 1985, 57, 82.
- 74 R. S. Devoto, Phys. Fluids 1967, 10, 2105.
- 75 J. O. Hirschfelder, C. F. Curtiss, R. B. Bird, Molecular Theory of Gases and Liquids Wiley, New York, USA 1954, Ch. 7 and 8.
- 76 J. Jolly, M. Touzeau, J. Quant. Spectrosc. Radiat. Transfer. 1975, 15, 863.
- 77
T. Fujimoto,
Plasma Spectroscopy
Oxford University Press Inc.,
New York, USA
2004.
10.1093/acprof:oso/9780198530282.001.0001 Google Scholar
- 78 M. Schulze, A. Yanguas-Gil, A. Keudell, P. Awakowicz, J. Phys. D: Appl. Phys. 2008, 41, 065206.
- 79 V. Sushkov, H. Do, R. Hippler, Contrib. Plasma Phys. 2013, 53, 549.
- 80 A. Phelps, Phys. Rev. 1958, 110, 1362.
- 81
S. G. Rabinovich,
Evaluating Measurement Accuracy: A practical Approach
Springer-Verlag,
New York, USA
2010, p. 148.
10.1007/978-1-4419-1456-9 Google Scholar
- 82 Y. Li, M. H. Gordon, L. A. Roe, K. Hassouni, T. Grotjohn, J. Appl. Phys. 2003, 94, 85.
- 83 A. Hartgers, G. M. Janssen, J. J. A. M. van der Mullen, J. Phys. D: Appl. Phys. 2003, 36, 114.
