Note
Synthesis of photo-scissible poly(p-hydroxystyrene) derivatives by radical copolymerization of p-hydroxystyrene derivatives and methyl vinyl ketone
Graphical Abstract
A synthesis of a copolymer composed of p-hydroxystyrene (HSt) and methyl vinyl ketone (MVK) units was performed by radical copolymerization of O-protected HSt (protective group=tert-butyl, ethoxyethyl, and acetyl) with MVK followed by removal of the protective groups and photodegradable behavior of obtained copolymers. The molecular weights of these copolymers decreased under photoirradiation due to the Norrish-type II reaction of the ketone groups of MVK units. These results demonstrate that a copolymer composed of HSt and MVK units possesses good photo-scissibility.
