Synthesis and Tribological Behavior of Silicon Oiycarbonitride Thin Films Derived from Poly(Urea)Methyl Vinyl Silazane
Tsali J. Cross,
Rishi Raj, Tsali J. Cross,
Somuri V. Prasad,
David R. Tallant,
Tsali J. Cross
University of Colorado at Boulder, Department of Mechanical Engineering, Boulder, Colorado 80309
Search for more papers by this authorTsali J. Cross
Sandia National Laboratories, * Materials and Process Sciences Center, Albuquerque, New Mexico 87185
Search for more papers by this authorSomuri V. Prasad
Search for more papers by this authorDavid R. Tallant
Search for more papers by this authorTsali J. Cross,
Rishi Raj, Tsali J. Cross,
Somuri V. Prasad,
David R. Tallant,
Tsali J. Cross
University of Colorado at Boulder, Department of Mechanical Engineering, Boulder, Colorado 80309
Search for more papers by this authorTsali J. Cross
Sandia National Laboratories, * Materials and Process Sciences Center, Albuquerque, New Mexico 87185
Search for more papers by this authorSomuri V. Prasad
Search for more papers by this authorDavid R. Tallant
Search for more papers by this author The American Ceramic Society,
The American Ceramic Society
Search for more papers by this authorBook Author(s): The American Ceramic Society,
The American Ceramic Society
Search for more papers by this authorSummary
A process for deposition of silicon oxycarbonitride films from poly (urea) methyl vinyl silazane (PUMVS) by spin coating precursor solutions onto a substrate, followed by polymerization, cross-linking and pyrolysis is developed. Silicon oxycarbonitride (SiCNO) ceramics are promising materials for microelectronics and optoelectronics, owing to high-temperature oxidation resistance, tunable band gap characteristics, adjustable transparency in the visible and IR regions, and high-temperature thermal stability. This chapter synthesizes SiCNO PDCs into thin films, characterize their micro-structure and chemistry, and evaluate their tribological behavior in various environments. It developed a process for deposition of SiCNO films from PUMVS. Films pyrolyzed in ammonia showed an initial coefficient of friction of 0.2, which decreased progressively with sliding distance. The mechanism of low friction is because of the formation of wear debris roll-ups. All films wore through in humid environments without forming friction-reducing roll-ups.
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10.1016/0043-1648(64)90083-3 Google Scholar
- T. Cross, S. V. Prasad, D. R. Tallant, and R. Raj. MANUSCRIPT IN PROGRESS.
