Volume 220, Issue 16 2200836
Research Article

Performance of Ultraviolet-B Laser Diodes on AlGaN Templates Prepared Using Different Fabrication Methods

Eri Matsubara

Eri Matsubara

Department of Materials Science and Engineering, Meijo University, 468-8502 Japan

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Tomoya Omori

Tomoya Omori

Department of Materials Science and Engineering, Meijo University, 468-8502 Japan

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Ryota Hasegawa

Ryota Hasegawa

Department of Materials Science and Engineering, Meijo University, 468-8502 Japan

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Kazuki Yamada

Kazuki Yamada

Department of Materials Science and Engineering, Meijo University, 468-8502 Japan

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Ayumu Yabutani

Ayumu Yabutani

Department of Materials Science and Engineering, Meijo University, 468-8502 Japan

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Ryosuke Kondo

Ryosuke Kondo

Department of Materials Science and Engineering, Meijo University, 468-8502 Japan

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Toma Nishibayashi

Toma Nishibayashi

Department of Materials Science and Engineering, Meijo University, 468-8502 Japan

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Sho Iwayama

Sho Iwayama

Department of Materials Science and Engineering, Meijo University, 468-8502 Japan

Graduate School of Electrical and Electronic Engineering, Mie University, 514-8507 Japan

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Tetsuya Takeuchi

Tetsuya Takeuchi

Department of Materials Science and Engineering, Meijo University, 468-8502 Japan

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Satoshi Kamiyama

Satoshi Kamiyama

Department of Materials Science and Engineering, Meijo University, 468-8502 Japan

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Hideto Miyake

Hideto Miyake

Graduate School of Electrical and Electronic Engineering, Mie University, 514-8507 Japan

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Motoaki Iwaya

Corresponding Author

Motoaki Iwaya

Department of Materials Science and Engineering, Meijo University, 468-8502 Japan

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First published: 03 March 2023

Abstract

Herein, the differences in the characteristics of ultraviolet-B (UV-B) laser diodes (LDs) are investigated and fabricated on AlGaN templates prepared using two types of fabrication methods: 1) spontaneous nucleation in which AlGaN is grown 3D from spontaneously generated AlN crystal nuclei and 2) AlN nanopillar in which AlGaN is grown on AlN nanopillars. The LD formed on the AlGaN fabricated using the AlN nanopillar method of slope efficiency and maximum peak light output power is improved four and six times, respectively, which are significantly better compared with the spontaneous nucleation method. The analysis also confirms the differences in injection efficiency and internal loss in the semiconductor crystal. Furthermore, detailed analysis of the current–voltage characteristics shows that the AlN nanopillar method has lower reverse leakage current and n-value than the spontaneous nucleation method. Comparison of these differences with crystallographic properties suggests that these differences in device properties are manifested by differences in V-shaped pits and dislocation density. The reduction of dislocations and V-shaped pit density in an AlGaN template is important to realize high-performance UV-B LDs, and the AlN nanopillar method is found to be useful for the fabrication of a suitable AlGaN template.

Conflict of Interest

The authors declare no conflict of interest.

Data Availability Statement

The data that support the findings of this study are available on request from the corresponding author. The data are not publicly available due to privacy or ethical restrictions.

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