Evolution of parasitic phases with growth temperature in sputtered BiFeO3 thick films and their effect on magnetic properties
Limin Kang
Key Laboratory for Liquid-Solid Structural Evolution and Processing of Materials (Ministry of Education), Engineering Ceramics Key Laboratory of Shandong Province, School of Materials Science and Engineering, Shandong University, Jinan, Shandong, 250061 P.R. China
Search for more papers by this authorWei Zhang
Key Laboratory for Liquid-Solid Structural Evolution and Processing of Materials (Ministry of Education), Engineering Ceramics Key Laboratory of Shandong Province, School of Materials Science and Engineering, Shandong University, Jinan, Shandong, 250061 P.R. China
Search for more papers by this authorYi Sun
Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai, 200050 P.R. China
Search for more papers by this authorCorresponding Author
Jun Ouyang
Key Laboratory for Liquid-Solid Structural Evolution and Processing of Materials (Ministry of Education), Engineering Ceramics Key Laboratory of Shandong Province, School of Materials Science and Engineering, Shandong University, Jinan, Shandong, 250061 P.R. China
Corresponding author: e-mail [email protected], Phone/Fax: +86-0531-88395816Search for more papers by this authorLimin Kang
Key Laboratory for Liquid-Solid Structural Evolution and Processing of Materials (Ministry of Education), Engineering Ceramics Key Laboratory of Shandong Province, School of Materials Science and Engineering, Shandong University, Jinan, Shandong, 250061 P.R. China
Search for more papers by this authorWei Zhang
Key Laboratory for Liquid-Solid Structural Evolution and Processing of Materials (Ministry of Education), Engineering Ceramics Key Laboratory of Shandong Province, School of Materials Science and Engineering, Shandong University, Jinan, Shandong, 250061 P.R. China
Search for more papers by this authorYi Sun
Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai, 200050 P.R. China
Search for more papers by this authorCorresponding Author
Jun Ouyang
Key Laboratory for Liquid-Solid Structural Evolution and Processing of Materials (Ministry of Education), Engineering Ceramics Key Laboratory of Shandong Province, School of Materials Science and Engineering, Shandong University, Jinan, Shandong, 250061 P.R. China
Corresponding author: e-mail [email protected], Phone/Fax: +86-0531-88395816Search for more papers by this authorAbstract
In this work, BiFeO3 thick films (∼500 nm) with tunable magnetic properties were prepared on (100) LaAlO3 substrates at temperatures of 650, 700, and 750 °C by using a radio-frequency (RF) magnetron sputtering technique, followed by a cooling process in a low pressure, pure oxygen atmosphere. The thick films contain small amount of Bi2O3 and Fe2O3 parasitic phases, in addition to the main crystalline phase of {100}-oriented rhombohedral BiFeO3. It was disclosed that the growth temperature had a paramount effect on the morphology and crystallinity of parasitic phases in the BiFeO3 thick films, which determined their magnetic properties including coercive field, magnetization, magnetic susceptibility, and magnetic anisotropy.
References
- 1 J. Wang, J. B. Neaton, H. Zheng, V. Nagarajan, S. B. Ogale, B. Liu, D. Viehland, V. Vaithyanathan, D. G. Schlom, U. V. Waghmare, N. A. Spaldin, K. M. Rabe, M. Wuttig, and R. Ramesh, Science 299, 1719–1722 (2003).
- 2 R. J. Zeches, M. D. Rossell, J. X. Zhang, A. J. Hatt, Q. He, C. H. Yang, A. Kumar, C. H. Wang, A. Melville, C. Adamo, G. Sheng, Y. H. Chu, J. F. Ihlefeld, R. Erni, C. Ederer, V. Gopalan, L. Q. Chen, D. G. Schlom, N. A. Spaldin, L. W. Martin, and R. Ramesh, Science 326, 977–980 (2009).
- 3 J. X. Zhang, B. Xiang, Q. He, J. Seidel, R. J. Zeches, P. Yu, S. Y. Yang, C. H. Wang, Y. H. Chu, L. W. Martin, A. M. Minor, and R. Ramesh, Nature Nanotechnol. 6, 98–102 (2011).
- 4 J. G. Wu, J. Wang, D. Q. Xiao, and J. G. Zhu, Phys. Status Solidi RRL 5, 190–192 (2011).
- 5 J. L. Xu, Z. Jia, N. W. Zhang, and T. L. Ren, J. Appl. Phys. 111, 074101 (2012).
- 6 L. You, N. T. Chua, K. Yao, L. Chen, and J. Wang, Phys. Rev. B 80, 024105 (2009).
- 7 S. Fujino, M. Murakami, S. H. Lim, M. Wuttig, L. G. Salamanca-Riba, and I. Takeuchi, Solid State Ion. 178, 1257–1261 (2007).
- 8 S. Yakovlev, J. Zekonyte, C. H. Solterbeck, and M. Es-Souni, Thin Solid Films 493, 24–29 (2005).
- 9 K. Y. Yun, M. Noda,1 M. Okuyama, H. Saeki, H. Tabata, and K. Saito, J. Appl. Phys. 96, 3399 (2004).
- 10 A. T. Raghavender, N. H. Hong, C. Park, M. H. Jung, K. J. Lee, and D. Lee, Mater. Lett. 65, 2786–2788 (2011).
- 11 J. G. Wu, B. Y. Zhang, X. P. Wang, J. Wang, J. G. Zhu, and D. Q. Xiao, Mater. Res. Bull. 48, 2973–2977 (2013).
- 12 W. Eerenstein, F. D. Morrison, J. Dho, M. G. Blamire, J. F. Scott, and N. D. Mathur, Science 307, 1203 (2005).
- 13 J. G. Wu, J. Wang, D. Q. Xiao, and J. G. Zhu, Electrochem. Solid State 14, 57–5759 (2011).
- 14 M. Murakami, S. Fujino, S. H. Lim, L. G. Salamanca-Riba, M. Wuttig, I. Takeuchi, B. Varughese, H. Sugaya, T. Hasegawa, and S. E. Lofland, Appl. Phys. Lett. 88, 112505 (2006).
- 15 M. C. Li, A. Kursumovic, X. D. Qi, and J. L. MacManus-Driscoll, J. Cryst. Growth 293, 128–135 (2006).
- 16 S. H. Lim, M. Murakami, W. L. Sarney, S. Q. Ren, A. Varatharajan, V. Nagarajan, S. Fujino, M. Wuttig, I. Takeuchi, and L. G. Salamanca-Riba, Adv. Funct. Mater. 17, 2594–2599 (2007).
- 17 J. Wang, A. Scholl, H. Zheng, S. B. Ogale, D. Viehland, D. G. Schlom, N. A. Spaldin, K. M. Rabe, M. Wuttig, L. Mohaddes, J. Neaton, U. Waghmare, T. Zhao, and R. Ramesh, Science 307, 1203 (2005).
- 18 C. B. Eom, J. Z. Sun, B. M. Lairson, S. K. Streiffer, A. F. Marshall, K. Yamamoto, S. M. Anlage, J. C. Bravman, and T. H. Geballea, Physica C 171, 354–3383 (1990).
- 19 W. B. Luo, J. Zhu, Y. R. Li, X. P. Wang, D. Zhao, J. Xiong, and Y. Zhang, Appl. Phys. Lett. 91, 082501 (2007).
- 20 J. Kreisel, P. Jadhav, O. Chaix-Pluchery, M. Varela, N. Dix, F. Sánchez, and J. Fontcuberta, J. Phys.: Condens. Matter 23, 34–37 (2011).
- 21 D. Mazumdar, V. Shelke, M. Iliev, S. Jesse, A. Kumar, S. Kalinin, A. Baddorf, and A. Gupta, Nano Lett. 10, 2555–2561 (2010).
- 22 Z. H. Chen, Z. L. Luo, C. W. Huang, Y. J. Qi, P. Yang, L. You, C. S. Hu, T. Wu, J. Wang, C. Gao, T. Sritharan, and L. Chen, Adv. Funct. Mater. 21, 133–138 (2011).
- 23 T. Schedel-Niedrig, W. Weiss, and R. Schlögl, Phys. Rev. B 52, 17449 (1995).
- 24 J. G. Wu and J. Wang, J. Appl. Phys. 106, 104111 (2009).
- 25 H. Béa, M. Bibes, A. Barthélémy, K. Bouzehouane, E. Jacquet, A. Khodan, J. P. Contour, S. Fusil, F. Wyczisk, A. Forget, D. Lebeugle, D. Colson, and M. Viret, Appl. Phys. Lett. 87, 072508 (2005).