Volume 45, Issue 4 pp. 5806-5814
RESEARCH ARTICLE

Improved Al2O3/SiNx and SiO2/SiNx stack passivation layer structure PERC sc-silicon solar cells on mass production line

Hao Liu

Corresponding Author

Hao Liu

Faculty of Applied Technology, Huaiyin Institute of Technology, Huaian, China

Correspondence

Hao Liu and Zhengzhong Zhang, Faculty of Applied Technology, Huaiyin Institute of Technology, Huaian 223001, China.

Email: [email protected] (H. L.) and [email protected] (Z. Z.)

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Ya Wang

Ya Wang

School of Mechanical Engineering and Information, Shanghai Urban Construction Vocational College, Shanghai, China

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Liming Dong

Liming Dong

School of Automotive Engineering, Changshu Institute of Technology, Changshu, China

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Haiou Wang

Haiou Wang

Institute of Materials Physics, Hangzhou Dianzi University, Hangzhou, China

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Zhengzhong Zhang

Corresponding Author

Zhengzhong Zhang

Faculty of Applied Technology, Huaiyin Institute of Technology, Huaian, China

Correspondence

Hao Liu and Zhengzhong Zhang, Faculty of Applied Technology, Huaiyin Institute of Technology, Huaian 223001, China.

Email: [email protected] (H. L.) and [email protected] (Z. Z.)

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First published: 09 November 2020
Citations: 14

Funding information: National Natural Science Foundation of China, Grant/Award Numbers: 11404322, 11604067, 51805048; Natural Science Foundation of the Jiangsu Higher Education Institutions of China, Grant/Award Number: 18KJD140005

Summary

In this study, we have successfully developed an industrially feasible stack rear Al2O3/SiNx and front SiO2/SiNx passivation layer PERC solar cells fabrication method based on the existing PERC sc-silicon solar cells production line. The manufacturing parameters of the deposition processes were adapted to get the best passivation effect. The front SiO2/SiNx passivation layer deposition parameters were researched for the best front passivation effect. The fabrication parameters of the first high refractive index SiNx layer were improved. And a new thin low refractive index SiNx capping layer at SiO2/SiNx interface was introduced. Meanwhile, the stack rear Al2O3/SiNx layer structure with double SiNx layers was also researched, which exhibited good passivation results for the rich hydrogen content in high refractive index SiNx layer. The industrial stack passivation layers PERCs with new thin low refractive index SiNx capping layer possess good performances with an efficiency of 22.15%.

DATA AVAILABILITY STATEMENT

The data that support the findings of this study are available from the corresponding author upon reasonable request.

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