Volume 27, Issue 6 pp. 1674-1680
research papers

Geometric determination of direction of dislocations using synchrotron X-ray transmission topography

T. O. Tuomi

Corresponding Author

T. O. Tuomi

Department of Electronics and Nanoengineering, Aalto University, PO Box 13500, FIN-00076Aalto, Finland

T. O. Tuomi, e-mail: [email protected]Search for more papers by this author
A. Lankinen

A. Lankinen

Department of Electronics and Nanoengineering, Aalto University, PO Box 13500, FIN-00076Aalto, Finland

Okmetic Oy, Piitie 2, FI-01510Vantaa, Koivuhaka, Finland

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O. Anttila

O. Anttila

Department of Electronics and Nanoengineering, Aalto University, PO Box 13500, FIN-00076Aalto, Finland

Finsil Ltd, Saunamaentie 11, 02770Espoo, Finland

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First published: 28 September 2020

Abstract

When performing transmission polychromatic beam topography, the extensions to the line segments of the diffraction images of a straight dislocation are shown to intersect at a single point on the X-ray film. The location of this point, together with the diffraction pattern recorded on the film by synchrotron radiation, gives the crystallographic direction [hkl] of the dislocation unambiguously. The results of two synchrotron topography experiments are presented. Very long dislocations found in the center of a large 450 mm-diameter Czochralski silicon crystal align with the growth direction [001]. In the other silicon sample, the dislocations are of mixed type and along the [011] direction.

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