Volume 255, Issue 6 1700676
Original Paper

Effects of Hydrostatic Pressure and Biaxial Strains on the Elastic and Electronic Properties of β-Si3N4

Haiyan Zhu

Haiyan Zhu

School of Physical Science and Technology China University of Mining and Technology, Xuzhou 221116, P.R. China

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Liwei Shi

Corresponding Author

Liwei Shi

School of Physical Science and Technology China University of Mining and Technology, Xuzhou 221116, P.R. China

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Shuaiqi Li

Shuaiqi Li

School of Physical Science and Technology China University of Mining and Technology, Xuzhou 221116, P.R. China

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Shaobo Zhang

Shaobo Zhang

School of Physical Science and Technology China University of Mining and Technology, Xuzhou 221116, P.R. China

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Tianliang Tang

Tianliang Tang

School of Physical Science and Technology China University of Mining and Technology, Xuzhou 221116, P.R. China

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Wangsuo Xia

Corresponding Author

Wangsuo Xia

School of Physical Science and Technology China University of Mining and Technology, Xuzhou 221116, P.R. China

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First published: 12 February 2018
Citations: 5

Abstract

First principles calculations have been performed to investigate the effects of hydrostatic pressure and biaxial strains (ϵxx) on the electronic and elastic properties of β-Si3N4. Both bulk modulus and Vickers hardness enhance (decrease) with pressure and compressive (tensile) ϵxx. The evolution of BH/GH ratio indicates that β-Si3N4 has a better (worse) ductile behavior under pressure and compressive (tensile) ϵxx. The 3D plots of Young's modulus show huge difference in mechanical properties between [0001] direction and a-b plane and the anisotropy becomes larger by using strain engineering. The sound velocities and Debye temperature are also discussed. The energy gap increases monotonically with pressure, however, strain-induced changes in band gap are asymmetric and nonlinear. β-Si3N4 undergoes an indirect to direct band gap transition at biaxial strain of 5%, while β-Si3N4 is always an indirect band gap semiconductor under pressure and compressive strains.

Conflict of Interest

The authors declare no conflict of interest.

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