Volume 203, Issue 9 pp. 2274-2280
Original Paper

Deposition of thallium sulfide layers on polyethylene and nanostructured silica by a sulfurisation-reaction process

Ingrida Bruzaite

Corresponding Author

Ingrida Bruzaite

Department of Inorganic Chemistry, Kaunas University of Technology, Radvilėnų 19, 50254, Kaunas, Lithuania

Phone: +370 37 451588, Fax: +370 37 451588Search for more papers by this author
Valentinas Snitka

Valentinas Snitka

Research Centre for Microsystems and Nanotechnology, Kaunas University of Technology, Studentu 65, Kaunas, Lithuania

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Vitalijus Janickis

Vitalijus Janickis

Department of Inorganic Chemistry, Kaunas University of Technology, Radvilėnų 19, 50254, Kaunas, Lithuania

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First published: 10 July 2006
Citations: 4

Abstract

Thallium sulfide layers on the surface of polyethylene are formed if they have been sulfured in a solution of higher polythionic acid, H2S33O6, and then treated with the alkaline solution of thallium(I) sulfate. Three phases TlS, Tl2S, Tl2S2 were identified by X-ray diffraction analysis in thallium sulfide layers. Surface morphology of the films was characterized with a scanning electron microscope (SEM) and atomic force microscope (AFM). The films deposited on the PE substrate have a no-homogeneous structure and consist of separated islands, the average roughness up to 10 µm. The deposition on the silica-polystyrene beads matrix has a homogeneous structure and the average roughness is in the range of 100–150 nm. (© 2006 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)

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