Volume 203, Issue 7 pp. 1645-1649
Original Paper

New method for the in situ determination of AlxGa1–xN composition in MOVPE by real-time optical reflectance

H. Hardtdegen

Corresponding Author

H. Hardtdegen

Institute of Thin Films and Interfaces, Center of Nanoelectronic Systems for Information Technology, Research Center Jülich, 52425 Jülich, Germany

Phone: +49 2461 61 2360, Fax: +49 2461 61 8143Search for more papers by this author
N. Kaluza

N. Kaluza

Institute of Thin Films and Interfaces, Center of Nanoelectronic Systems for Information Technology, Research Center Jülich, 52425 Jülich, Germany

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Z. Sofer

Z. Sofer

Institute of Thin Films and Interfaces, Center of Nanoelectronic Systems for Information Technology, Research Center Jülich, 52425 Jülich, Germany

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Y. S. Cho

Y. S. Cho

Institute of Thin Films and Interfaces, Center of Nanoelectronic Systems for Information Technology, Research Center Jülich, 52425 Jülich, Germany

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R. Steins

R. Steins

Institute of Thin Films and Interfaces, Center of Nanoelectronic Systems for Information Technology, Research Center Jülich, 52425 Jülich, Germany

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H. L. Bay

H. L. Bay

Institute of Thin Films and Interfaces, Center of Nanoelectronic Systems for Information Technology, Research Center Jülich, 52425 Jülich, Germany

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Y. Dikme

Y. Dikme

Institut für Theoretische Elektrotechnik, RWTH Aachen, Templergraben 55, 52056 Aachen, Germany

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H. Kalisch

H. Kalisch

Institut für Theoretische Elektrotechnik, RWTH Aachen, Templergraben 55, 52056 Aachen, Germany

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R. H Jansen

R. H Jansen

Institut für Theoretische Elektrotechnik, RWTH Aachen, Templergraben 55, 52056 Aachen, Germany

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M. Heuken

M. Heuken

AIXTRON AG, Kackertstr. 15–17, 52072 Aachen, Germany

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A. Strittmatter

A. Strittmatter

Institut für Festkörperphysik, TU Berlin, Hardenbergstr. 36, 10623 Berlin, Germany

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L. Reißmann

L. Reißmann

Institut für Festkörperphysik, TU Berlin, Hardenbergstr. 36, 10623 Berlin, Germany

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D. Bimberg

D. Bimberg

Institut für Festkörperphysik, TU Berlin, Hardenbergstr. 36, 10623 Berlin, Germany

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J.-T. Zettler

J.-T. Zettler

LayTec, Helmholtzstr. 13–14, 10587 Berlin, Germany

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First published: 18 May 2006
Citations: 2

Abstract

This paper reports on the in situ determination of the Al-content in Alx Ga1–x N layers deposited by MOVPE on sapphire and silicon substrates by means of optical reflectance. The accuracy of the conventional in situ method which utilizes the dependence of the refractive index and the extinction coefficient on Al-content is compared to that of the new dispersion approach. The limits and possibilities of the new approach will be discussed. (© 2006 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)

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