Volume 50, Issue 8 pp. 1462-1468
Article

Photoinduced depolymerization in poly(olefin sulfone) films comprised of volatile monomers doped with a photobase generator

Takeo Sasaki

Corresponding Author

Takeo Sasaki

Department of Chemistry, Faculty of Science, Tokyo University of Science, 1-3 Kagurazaka, Shinjuku-ku, Tokyo 162-8601, Japan

Department of Chemistry, Faculty of Science, Tokyo University of Science, 1-3 Kagurazaka, Shinjuku-ku, Tokyo 162-8601, JapanSearch for more papers by this author
Takayuki Kondo

Takayuki Kondo

Department of Chemistry, Faculty of Science, Tokyo University of Science, 1-3 Kagurazaka, Shinjuku-ku, Tokyo 162-8601, Japan

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Motoki Noro

Motoki Noro

Department of Chemistry, Faculty of Science, Tokyo University of Science, 1-3 Kagurazaka, Shinjuku-ku, Tokyo 162-8601, Japan

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Kazuya Saida

Kazuya Saida

Department of Chemistry, Faculty of Science, Tokyo University of Science, 1-3 Kagurazaka, Shinjuku-ku, Tokyo 162-8601, Japan

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Hiroaki Yaguchi

Hiroaki Yaguchi

Department of Chemistry, Faculty of Science, Tokyo University of Science, 1-3 Kagurazaka, Shinjuku-ku, Tokyo 162-8601, Japan

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Yumiko Naka

Yumiko Naka

Department of Chemistry, Faculty of Science, Tokyo University of Science, 1-3 Kagurazaka, Shinjuku-ku, Tokyo 162-8601, Japan

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First published: 04 January 2012
Citations: 21

Abstract

Photoinduced depolymerization of poly(olefin sulfone)s mixed with a photobase generating compound was investigated. Irradiation of 254 nm UV light to films comprising of a mixture of a photobase generating compound and poly(olefin sulfone)s with volatile monomers caused photoinduced depolymerization and the irradiated part of the film vaporized. The effect of the poly(olefin sulfone) structure on the photoinduced depolymerization process was investigated. © 2012 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem, 2012

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