Volume 9, Issue 2 2170023
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Interface Engineering for High-Performance Photoelectrochemical Cells via Atomic Layer Deposition Technique

Shiyao Cao

Shiyao Cao

State Key Laboratory for Advanced Metals and Materials, School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing, 100083 P. R. China

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Zheng Zhang

Zheng Zhang

State Key Laboratory for Advanced Metals and Materials, School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing, 100083 P. R. China

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Qingliang Liao

Qingliang Liao

State Key Laboratory for Advanced Metals and Materials, School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing, 100083 P. R. China

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Zhuo Kang

Corresponding Author

Zhuo Kang

State Key Laboratory for Advanced Metals and Materials, School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing, 100083 P. R. China

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Yue Zhang

Corresponding Author

Yue Zhang

Beijing Advanced Innovation Center for Materials Genome Engineering, Beijing Key Laboratory for Advanced Energy Materials and Technologies, University of Science and Technology Beijing, Beijing, 100083 P. R. China

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First published: 05 February 2021
Citations: 1

Graphical Abstract

A short overview of atomic layer deposition (ALD) application in the interface engineering of photoelectrochemical (PEC) cells is given. The results of ALD technology-based interface and surface engineering for high-performance PEC cells in recent years are summarized and the challenges and opportunities of the development of ALD-based interface engineering for high-performance PEC cells in the near future are discussed. More details can be found in article number 2000819 by Zhuo Kang, Yue Zhang, and co-workers.

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