Volume 136, Issue 33 e202403333
Forschungsartikel

Light-Induced Dynamic Activation of Copper/Silicon Interface for Highly Selective Carbon Dioxide Reduction

Jiali Wang

Jiali Wang

Department of Chemistry and Center for Emerging Materials and Advanced Devices, National Taiwan University, Taipei, 10617 Taiwan

These authors contributed equally.

Contribution: Conceptualization (lead), Writing - original draft (lead)

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Tai Ying Lai

Tai Ying Lai

Department of Chemistry and Center for Emerging Materials and Advanced Devices, National Taiwan University, Taipei, 10617 Taiwan

These authors contributed equally.

Contribution: Data curation (lead), Formal analysis (lead)

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Han-Ting Lin

Han-Ting Lin

Department of Chemistry and Center for Emerging Materials and Advanced Devices, National Taiwan University, Taipei, 10617 Taiwan

These authors contributed equally.

Contribution: Conceptualization (lead), Data curation (lead), Formal analysis (lead)

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Tsung-Rong Kuo

Corresponding Author

Tsung-Rong Kuo

Graduate Institute of Nanomedicine and Medical Engineering, College of Biomedical Engineering, Taipei Medical University, Taipei, 11031 Taiwan

Precision Medicine and Translational Cancer Research Center, Taipei Medical University Hospital, Taipei, 11031 Taiwan

These authors contributed equally.

Contribution: Formal analysis (lead), Funding acquisition (lead)

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Hsiao-Chien Chen

Hsiao-Chien Chen

Center for Reliability Sciences and Technologies, Chang Gung University, Taoyuan, 333 Taiwan

Contribution: Data curation (equal)

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Chun-Sheng Tseng

Chun-Sheng Tseng

Department of Chemistry and Center for Emerging Materials and Advanced Devices, National Taiwan University, Taipei, 10617 Taiwan

Contribution: Data curation (equal)

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Ching-Wei Tung

Corresponding Author

Ching-Wei Tung

Center for Environmental Sustainability and Human Health, Ming Chi University of Technology, New Taipei City, 24301 Taiwan

Contribution: Data curation (equal)

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Chia-Ying Chien

Chia-Ying Chien

Department of Chemistry and Center for Emerging Materials and Advanced Devices, National Taiwan University, Taipei, 10617 Taiwan

Contribution: Data curation (lead)

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Hao Ming Chen

Corresponding Author

Hao Ming Chen

Department of Chemistry and Center for Emerging Materials and Advanced Devices, National Taiwan University, Taipei, 10617 Taiwan

National Synchrotron Radiation Research Center, Hsinchu, 30076 Taiwan

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First published: 24 May 2024

Abstract

Numerous studies have shown a fact that phase transformation and/or reconstruction are likely to occur and play crucial roles in electrochemical scenarios. Nevertheless, a decisive factor behind the diverse photoelectrochemical activity and selectivity of various copper/silicon photoelectrodes is still largely debated and missing in the community, especially the possibly dynamic behaviors of metal catalyst/semiconductor interface. Herein, through in situ X-ray absorption spectroscopy and transmission electron microscope, a model system of Cu nanocrystals with well-defined facets on black p-type silicon (BSi) is unprecedentedly demonstrated to reveal the dynamic phase transformation of forming irreversible silicide at Cu nanocrystal-BSi interface during photoelectrocatalysis, which is validated to originate from the atomic interdiffusion between Cu and Si driven by light-induced dynamic activation process. Significantly, the adaptive junction at Cu−Si interface is activated by an expansion of interatomic Cu−Cu distance for CO2 electroreduction, which efficiently restricts the C−C coupling pathway but strengthens the bonding with key intermediate of *CHO for CH4 yield, resulting in a remarkable 16-fold improvement in the product ratio of CH4/C2 products and an intriguing selectivity switch. This work offers new insights into dynamic structural transformations of metal/semiconductor junction and design of highly efficient catalysts toward photosynthesis.

Conflict of interests

There are no conflicts to declare.

Data Availability Statement

The data that support the findings of this study are available from the corresponding author upon reasonable request.

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