Organic Thermal Mode Photoresists for Applications in Nano‐Lithography - Supplemental Proceedings - Wiley Online Library

Organic Thermal Mode Photoresists for Applications in Nano-Lithography

Hsiu-Wen Wu,

Hsiu-Wen Wu

Dept. of Opto-Electronics, National Dong Hwa University, Hualien 970, Taiwan

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Ming Chia Li,

Ming Chia Li

Electronics and Optoelectronics Research Laboratories, ITRI, Hsinchu 310, Taiwan

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Chin-Tien Yang,

Chin-Tien Yang

Nanotechnology Research center, ITRI, Hsinchu 310, Taiwan

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Chung-Ta Cheng,

Chung-Ta Cheng

Electronics and Optoelectronics Research Laboratories, ITRI, Hsinchu 310, Taiwan

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Shuen-Chen Chen,

Shuen-Chen Chen

Electronics and Optoelectronics Research Laboratories, ITRI, Hsinchu 310, Taiwan

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Der-Ray Huang,

Der-Ray Huang

Dept. of Opto-Electronics, National Dong Hwa University, Hualien 970, Taiwan

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Hsiu-Wen Wu,

Hsiu-Wen Wu

Dept. of Opto-Electronics, National Dong Hwa University, Hualien 970, Taiwan

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Ming Chia Li,

Ming Chia Li

Electronics and Optoelectronics Research Laboratories, ITRI, Hsinchu 310, Taiwan

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Chin-Tien Yang,

Chin-Tien Yang

Nanotechnology Research center, ITRI, Hsinchu 310, Taiwan

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Chung-Ta Cheng,

Chung-Ta Cheng

Electronics and Optoelectronics Research Laboratories, ITRI, Hsinchu 310, Taiwan

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Shuen-Chen Chen,

Shuen-Chen Chen

Electronics and Optoelectronics Research Laboratories, ITRI, Hsinchu 310, Taiwan

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Der-Ray Huang,

Der-Ray Huang

Dept. of Opto-Electronics, National Dong Hwa University, Hualien 970, Taiwan

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Book Editor(s): TMS,

TMS

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First published: 17 March 2012

https://doi.org/10.1002/9781118356074.ch84

Citations: 2

Summary

This chapter contains sections titled:

Introduction
Experimental Details
Results and Discussion
Conclusions
Acknowledgments

References

Citing Literature

Supplemental Proceedings: Materials Processing and Interfaces, Volume 1