Volume 188, Issue 4 pp. 1423-1429
Original Paper

In-situ Determination of the Carrier Concentration of (001) GaAs by Reflectance Anisotropy Spectroscopy

M. Pristovsek

M. Pristovsek

National Institute for Materials Science, 1-2-1 Sengen, Tsukuba, Ibaraki 305-0047, Japan

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S. Tsukamoto

S. Tsukamoto

National Institute for Materials Science, 1-2-1 Sengen, Tsukuba, Ibaraki 305-0047, Japan

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N. Koguchi

N. Koguchi

National Institute for Materials Science, 1-2-1 Sengen, Tsukuba, Ibaraki 305-0047, Japan

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B. Han

B. Han

Technische Universität Berlin, Institut für Festkörperphysik, Hardenbergstraße 36, D-10623 Berlin, Germany

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K. Haberland

K. Haberland

Technische Universität Berlin, Institut für Festkörperphysik, Hardenbergstraße 36, D-10623 Berlin, Germany

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J.-T. Zettler

J.-T. Zettler

Technische Universität Berlin, Institut für Festkörperphysik, Hardenbergstraße 36, D-10623 Berlin, Germany

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W. Richter

W. Richter

Technische Universität Berlin, Institut für Festkörperphysik, Hardenbergstraße 36, D-10623 Berlin, Germany

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M. Zorn

M. Zorn

Ferdinand-Braun-Institut für Höchstfrequenztechnik, Albert-Einstein-Str. 11, D-12489 Berlin, Germany

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M. Weyers

M. Weyers

Ferdinand-Braun-Institut für Höchstfrequenztechnik, Albert-Einstein-Str. 11, D-12489 Berlin, Germany

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Abstract

We demonstrate the use of Reflectance Anisotropy Spectroscopy (RAS) to determine the carrier concentration in GaAs of the topmost layers (≈20 nm) in-situ during layer growth. The doping contributes to three features in the RAS spectra: an oscillation at E1/E1 + Δ1, an oscillation at E0′/E0′ + Δ0′ and an offset of the baseline of the whole spectrum. Using the empirical calibration in this paper, carrier concentrations above ≈1017 cm—3 can be easily measured by RAS for a given temperature, dopant and reconstruction.

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