Volume 202, Issue 1 pp. 177-200
Research Article

Use of Ta-Container for Sublimation Growth and Doping of SiC Bulk Crystals and Epitaxial Layers

Yu.A. Vodakov

Yu.A. Vodakov

A. F. Ioffe Physico-Technical Institute, Russian Academy of Sciences, Polytekhnicheskaya 26, 194021 St. Petersburg, Russia

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A. D. Roenkov

A. D. Roenkov

A. F. Ioffe Physico-Technical Institute, Russian Academy of Sciences, Polytekhnicheskaya 26, 194021 St. Petersburg, Russia

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M. G. Ramm

M. G. Ramm

A. F. Ioffe Physico-Technical Institute, Russian Academy of Sciences, Polytekhnicheskaya 26, 194021 St. Petersburg, Russia

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E. N. Mokhov

E. N. Mokhov

A. F. Ioffe Physico-Technical Institute, Russian Academy of Sciences, Polytekhnicheskaya 26, 194021 St. Petersburg, Russia

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Yu.N. Makarov

Yu.N. Makarov

Fluid Mechanics Department, University of Erlangen-Nürnberg, Cauerstraße 4, D-91058 Erlangen, Germany

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Abstract

Analysis of specific features of sublimation growth of bulk SiC crystals in presence of Ta is performed. Control of doping and formation of different SiC polytypes is discussed. Description of mechanisms responsible for generation of micropipes during sublimation growth of bulk crystals is given. It is shown that use of Ta is promising for growth of bulk SiC crystals.

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