Thin Films

Georg Wahl

Georg Wahl

Technische Universität Braunschweig, Institut für Oberflächentechnik, Braunschweig, Germany

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Paul B. Davies

Paul B. Davies

University of Cambridge, Department of Chemistry, Cambridge, United Kingdom

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Rointan F. Bunshah

Rointan F. Bunshah

University of California, Department of Materials Science and Engineering, Los Angeles, United States

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Bruce A. Joyce

Bruce A. Joyce

University of London, Imperial College of Science, Technology and Medicine, London, United Kingdom

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Colin D. Bain

Colin D. Bain

University of Oxford, Physical Chemistry Laboratory, Oxford, United Kingdom

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Gerhard Wegner

Gerhard Wegner

Max-Planck-Institut für Polymerforschung, Mainz, Germany

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Markus Remmers

Markus Remmers

Max-Planck-Institut für Polymerforschung, Mainz, Germany

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Francis C. Walsh

Francis C. Walsh

University of Portsmouth, Department of Chemistry, Portsmouth, United Kingdom

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Konrad Hieber

Konrad Hieber

Fraunhofer Gesellschaft, Institut für Festkörpertechnologie, München, Germany

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Jan-Eric Sundgren

Jan-Eric Sundgren

Linköping University, Department of Physics and Measurement Technology, Linköping, Sweden

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Peter K. Bachmann

Peter K. Bachmann

Philips GmbH, Research Laboratories, Aachen, Germany

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Shintaro Miyazawa

Shintaro Miyazawa

NTT LSI Laboratories, Kanagawa, Japan

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Alfred Thelen

Alfred Thelen

Ingenieurbüro Thelen für optische Interferenzschichten, Schmitten-Seelenberg, Germany

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Heiner Strathmann

Heiner Strathmann

University of Twente, Faculty of Chemical Technology, Enschede, The Netherlands

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Karen J. Edler

Karen J. Edler

University of Bath, Department of Chemistry, Claverton Down, Bath BA2, United Kingdom, 7AY

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First published: 31 January 2014

Abstract

The article contains sections titled:

1. Preparation of Thin Films
1.1. Chemical Vapor Deposition Processes
1.2. Plasma Polymerization
1.3. Physical Vapor Deposition (PVD) Processes
1.3.1. Sputter Deposition
1.3.2. Evaporation Deposition
1.3.3. Deposition of Metals, Alloys, and Compounds
1.4. Thin Film Growth by Molecular Beam Epitaxy (MBE)
1.4.1. Introduction
1.4.2. The Configuration of MBE Growth Systems
1.4.3. Monitoring Facilities
1.5. Thin Films by Adsorption Processes
1.5.1. Self-Assembled Monolayers
1.5.2. Self-Assembled Multilayers
1.6. Langmuir–Blodgett and Related Techniques
1.6.1. Low Molecular Mass Substances
1.6.2. Polymeric Amphiphilic LB Layers
1.6.3. Hairy Rod Polymers
1.7. Electrochemical Deposition Processes
1.7.1. Scope
1.7.2. Electrochemical Deposition of Metals and Alloys
1.7.3. Electrophoretic Coatings
1.7.4. Trends in Electrodeposition
1.8. Preparation of Inorganic Mesoporous Films
2. Thin Films as Materials
2.1. Coatings for Electronic Applications
2.1.1. Introduction
2.1.2. Hybrid Technology
2.1.3. Microsystems
2.1.4. Data Storage
2.1.5. Microelectronics
2.1.6. Semiconducting Films
2.1.7. Ferroelectrics
2.2. Hard and Decorative Nitride and Carbide Coatings
2.2.1. Introduction
2.2.2. Growth Techniques
2.2.3. Coating Microstructures
2.2.4. Adhesion
2.2.5. Hard Coatings
2.3. Carbon Films
2.3.1. Carbon Phases: Composition and Stability
2.3.2. Properties and Applications of Diamond Films
2.3.3. Properties and Applications of a-C : H, a-C, and ta-C Films
2.4. Metallic Films
2.4.1. Introduction
2.4.2. Electronics Applications
2.4.3. Engineering Coatings
2.4.4. Dispersed Catalytic Coatings
2.4.5. Developments and Trends
2.5. Superconductive Coatings
2.6. Polymer Films
2.6.1. Langmuir–Blodgett Layers of Polymer Films as Materials
2.6.2. Films by Plasma Polymerization
2.7. Optical Coatings
2.7.1. Introduction
2.7.2. Theory
2.7.3. Deposition Methods
2.7.4. Coating Materials
2.7.5. Classical Coatings
2.7.6. Nonclassical Coatings
2.7.7. Applications
2.8. Membranes
2.8.1. Introduction
2.8.2. Fundamentals
2.8.3. Membrane Structures and their Preparation
2.9. Properties and Applications of Mesoporous Films

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