Volume 11, Issue 3 pp. 131-135

Microwave performance of InP-based HEMTs for low-voltage application

S. Strähle

Corresponding Author

S. Strähle

Department of Electron Devices and Circuits, University of Ulm, Albert-Einstein-Allee 45, D-89069 Ulm, Germany

Department of Electron Devices and Circuits, University of Ulm, Albert-Einstein-Allee 45, D-89069 Ulm, GermanySearch for more papers by this author
B. Henle

B. Henle

Department of Electron Devices and Circuits, University of Ulm, Albert-Einstein-Allee 45, D-89069 Ulm, Germany

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L. Lee

L. Lee

Department of Electron Devices and Circuits, University of Ulm, Albert-Einstein-Allee 45, D-89069 Ulm, Germany

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H. Künzel

H. Künzel

Heinrich-Hertz-Institut Berlin GmbH, Einsteinufer 37, D-10587 Berlin, Germany

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T. Hackbarth

T. Hackbarth

Daimler-Benz Research Laboratory, Wilhelm-Runge Strasse 11, D 89081 Ulm, Germany

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J. Dickmann

J. Dickmann

Daimler-Benz Research Laboratory, Wilhelm-Runge Strasse 11, D 89081 Ulm, Germany

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E. Kohn

E. Kohn

Department of Electron Devices and Circuits, University of Ulm, Albert-Einstein-Allee 45, D-89069 Ulm, Germany

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Abstract

Usually high power gain is achieved at the expense of reduced ft. In this investigation a high fmax/ft ratio of 2.6 is obtained in combination with a ft * Lg product of 39 GHz μm, equivalent to an effective velocity of 2.45 * 107 cm/s. Despite a relaxed gate length of approximately 0.5 μm, these features were obtained at low drain bias of Vd = 1.5 V. © 1996 John Wiley & Sons, Inc.

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