Volume 32, Issue 45
Physical Inorganic Chemistry
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ChemInform Abstract: Ruthenium Oxide Film Electrodes Prepared at Low Temperatures for Electrochemical Capacitors.

Q. L. Fang

Q. L. Fang

Dep. Electr. Eng., Fla. A&M Univ., Tallahassee, FL 32310, USA

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D. A. Evans

D. A. Evans

Dep. Electr. Eng., Fla. A&M Univ., Tallahassee, FL 32310, USA

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S. L. Roberson

S. L. Roberson

Dep. Electr. Eng., Fla. A&M Univ., Tallahassee, FL 32310, USA

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J. P. Zheng

J. P. Zheng

Dep. Electr. Eng., Fla. A&M Univ., Tallahassee, FL 32310, USA

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First published: 23 May 2010

Abstract

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ChemInform Abstract

Ru oxide films are grown on Ta substrates at temperatures from 100 to 300 °C using a Ru(OEt)3 solution in EtOH. The films are characterized by XRD and SEM. Amorphous Ru oxide films are formed at temperatures of 100—200 °C. The highest specific capacitance of 593 F/g and interfacial capacitance of 4.0 F/cm2 are found for the film electrode grown at 200 °C.

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