Volume 50, Issue 5 pp. 1478-1489
research papers

X-ray diffraction study on a (111)-textured palladium thin film under hydrogen loading and unloading: film structure evolution and its mechanism

Takashi Harumoto

Corresponding Author

Takashi Harumoto

Department of Materials Science and Engineering, Tokyo Institute of Technology, 2-12-1 O-okayama, Meguro-ku, Tokyo, 152-8552, Japan

Takashi Harumoto, e-mail: [email protected]Search for more papers by this author
Yuichi Suzuki

Yuichi Suzuki

Materials Analysis Division, Tokyo Institute of Technology, 2-12-1 O-okayama, Meguro-ku, Tokyo, 152-8552, Japan

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Ji Shi

Ji Shi

Department of Materials Science and Engineering, Tokyo Institute of Technology, 2-12-1 O-okayama, Meguro-ku, Tokyo, 152-8552, Japan

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Yoshio Nakamura

Yoshio Nakamura

Department of Materials Science and Engineering, Tokyo Institute of Technology, 2-12-1 O-okayama, Meguro-ku, Tokyo, 152-8552, Japan

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First published: 29 September 2017

Abstract

The incorporation of hydrogen normally results in degradation when applied to metals. In this diffraction study, however, improvement of the film structure, such as in-plane grain growth, lattice defect removal and texture enhancement, was observed in a (111)-textured palladium thin film during hydrogen loading and unloading cycles. Accordingly, diffraction stress analysis was performed to investigate the evolution mechanism. It was found that the formation of the β phase during the α-to-β phase transformation occurred at the same in-plane stress present in the α phase, and vice versa. This suggests that the cyclic α–β grain boundary motion during the transformation occurred mainly along the in-plane direction, contributing to the film structure evolution.

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