Volume 34, Issue 2 pp. 90-100
Original Article
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Imaging and Nanofabrication With the Helium Ion Microscope of the Van Leeuwenhoek Laboratory in Delft

Paul F. A. Alkemade

Paul F. A. Alkemade

Kavli Institute of Nanoscience, Delft University of Technology, Delft, The Netherlands

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Emma M. Koster

Emma M. Koster

Kavli Institute of Nanoscience, Delft University of Technology, Delft, The Netherlands

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Emile van Veldhoven

Emile van Veldhoven

TNO - van Leeuwenhoek Laboratory, Delft, The Netherlands

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Diederik J. Maas

Diederik J. Maas

TNO - van Leeuwenhoek Laboratory, Delft, The Netherlands

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First published: 27 April 2012
Citations: 43
Address for reprints: Paul Alkemade, Kavli Institute of Nano-science, Delft University of Technology, Lorentzweg 1, 2628 CJ Delft, The Netherlands. E-mail: [email protected]

Contract grant sponsor: Dutch Nanoned Program; Contract grant sponsor: ASML Netherlands BV (Veldhoven); Contract grant sponsor: NXP Semiconductors (Eindhoven).

Summary

Although helium ion microscopy (HIM) was introduced only a few years ago, many new application fields are emerging. The connecting factor between these novel applications is the unique interaction of the primary helium ion beam with the sample material at and just below its surface. In particular, the HIM secondary electron signal stems from an area that is extremely well localized around the point of incidence of the primary beam. This makes the HIM well suited for both high-resolution imaging and high-resolution nanofabrication. Another advantage in nanofabrication is the low ion backscattering fraction, which leads to a weak proximity effect. The subnanometer probe size and the unique beam-materials interactions have opened new areas of research. This review presents a selection of studies conducted on a single instrument. The selection encompasses applications ranging from imaging to nanofabrication and from fundamental academic research to applied industrial developments. SCANNING 34: 90-100, 2012. © 2012 Wiley Periodicals, Inc.

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