Volume 30, Issue 2 pp. 59-64
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Structural Study of Titanium Oxide Films Synthesized by Ion Beam-Assisted Deposition

Gonghua Wang

Gonghua Wang

Department of Chemistry and Nebraska Centre for Materials and Nanoscience, University of Nebraska-Lincoln, Lincoln, NE 68588, USA

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Joseph R. Brewer

Joseph R. Brewer

Department of Chemistry and Nebraska Centre for Materials and Nanoscience, University of Nebraska-Lincoln, Lincoln, NE 68588, USA

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Fereydoon Namavar

Fereydoon Namavar

Department of Orthopaedic Surgery and Rehabilitation, University of Nebraska-Medical Center, Omaha, NE 68198, USA

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Renat F. Sabirianov

Renat F. Sabirianov

Department of Physics, University of Nebraska-Omaha, Omaha, NE 68182, USA

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Hani Haider

Hani Haider

Department of Orthopaedic Surgery and Rehabilitation, University of Nebraska-Medical Center, Omaha, NE 68198, USA

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Kevin L. Garvin

Kevin L. Garvin

Department of Orthopaedic Surgery and Rehabilitation, University of Nebraska-Medical Center, Omaha, NE 68198, USA

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Chin Li Cheung

Corresponding Author

Chin Li Cheung

Department of Chemistry and Nebraska Centre for Materials and Nanoscience, University of Nebraska-Lincoln, Lincoln, NE 68588, USA

Department of Chemistry and Nebraska Centre for Materials and Nanoscience, University of Nebraska-LincolnLincoln, NE 68588, USASearch for more papers by this author
First published: 20 February 2008
Citations: 10

Abstract

The application of titanium dioxide (TiO2) films as surgical implant coatings for antibiotic attachment depends crucially on their available surface area and thus their surface morphology and crystallinity. Here, we report our fabrication of high Wenzel ratio TiO2 films targeted to increase the film surface area using the ion beam-assisted deposition (IBAD) technique at high-deposition temperatures (∼610 °C). The modulation of the films' surface morphology was accomplished by varying the chemical identity of the concurrent ion beams bombarded on the films during the e-beam evaporation process. Atomic force microscopy (AFM) and scanning electron microscopy (SEM) were employed to investigate the surface morphology of the as-deposited films. X-ray diffractometry (XRD) revealed that these nanocrystalline films primarily consist of anatase phase TiO2. Wenzel ratio, the ratio of the actual surface area to the projected area, of IBAD films prepared with argon, oxygen, and nitrogen ion beams was measured to be 1.52, 1.31 and 1.49, respectively. The effect of the differences in chemical reactivity and ion size of these three type ion beams are discussed to explain the present results. SCANNING 30: 000–000, 2008. © 2008 Wiley Periodicals, Inc.

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