Volume 5, Issue 11 pp. 3463-3466
Contributed Article

A cleaner approach towards deposition of CdS thin films by an electrochemical technique

Anup Mondal

Corresponding Author

Anup Mondal

Department of Chemistry, Bengal Engineering and Science University, Shibpur, Howrah-711103, India

Phone: +91 33 2668 4561, Fax: +91 33 2668 2916Search for more papers by this author
Utpal Madhu

Utpal Madhu

School of Materials Science and Engineering, Bengal Engineering and Science University, Shibpur, Howrah-711103, India

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Nil Ratan Bandyopadhyay

Nil Ratan Bandyopadhyay

School of Materials Science and Engineering, Bengal Engineering and Science University, Shibpur, Howrah-711103, India

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First published: 01 October 2008
Citations: 1

Abstract

CdS thin films have been deposited on Transparent Conducting Oxide (TCO, containing SnO2: F) coated glass substrates from aqueous sodium thiosulfate solutions, using the galvanic technique. A cadmium foil was used as a sacrificial anode and was the only source of Cd++ ions for CdS thin films, no external bias being used during film depositions. The films have been characterized using X-ray diffraction, SEM, EDX, AFM and optical absorption studies. AAS analyses were carried out to determine the Cd content in solutions after film deposition. (© 2008 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)

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