Volume 3, Issue 4 pp. 793-796
Original Paper

ZnO crystals for substrates in micro and optoelectronic applications

K. Grasza

K. Grasza

Institute of Electronic Materials Technology, 133 Wólczyńska Str., 01-991 Warsaw, Poland

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A. Mycielski

A. Mycielski

Institute of Physics, Polish Academy of Sciences, Al. Lotników 32/46, 02-668 Warsaw, Poland

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J. Domagała

J. Domagała

Institute of Physics, Polish Academy of Sciences, Al. Lotników 32/46, 02-668 Warsaw, Poland

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V. Domukhovski

V. Domukhovski

Institute of Physics, Polish Academy of Sciences, Al. Lotników 32/46, 02-668 Warsaw, Poland

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W. Paszkowicz

W. Paszkowicz

Institute of Physics, Polish Academy of Sciences, Al. Lotników 32/46, 02-668 Warsaw, Poland

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H. Sakowska

H. Sakowska

Institute of Electronic Materials Technology, 133 Wólczyńska Str., 01-991 Warsaw, Poland

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W. Hofman

W. Hofman

Institute of Electronic Materials Technology, 133 Wólczyńska Str., 01-991 Warsaw, Poland

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First published: 07 March 2006
Citations: 8

Abstract

Zinc oxide crystals were grown by Chemical Vapour Transport using Contactless Crystal Growth technique. To apply powdered source material and long ampoules, modified temperature field was applied. 2.5 cm diameter crystals were obtained. The largest grains yielded 0.5 cm2 single crystalline substrates. The FWHM of the rocking curve was usually exceeding 60 arcsec, but areas with FWHM as low as 29 arcsec were also found. The electrical p-type conductivity of As-doped crystal was identified as increased arsenic content grain surface effect. (© 2006 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)

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