Volume 3, Issue 4 pp. 803-806
Original Paper

Defect-related emission in CdS films grown directly on hydrogen-terminated Si(111) substrates

S. Seto

Corresponding Author

S. Seto

Ishikawa National College of Technology, Tsubata, Kahoku, Ishikawa 929-0392, Japan

Phone: +81-76-288-8117, Fax: +81-76-288-8123Search for more papers by this author
T. Kuroda

T. Kuroda

Nanomaterial Laboratories, National Institute for Materials Science, Tsukuba 305-0003, Japan

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K. Suzuki

K. Suzuki

Hokkaido Institute of Technology, Maeda, Teine, Sapporo 006-8585, Japan

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First published: 07 March 2006
Citations: 7

Abstract

Defect-related emission at 2.451 eV in epitaxial CdS films on Si(111) substrates was observed for the first time in low-temperatures photoluminescence spectra. Temperature and excitation intensity dependence of the defect-related emission were measured to examine its emission mechanism. It was shown that this defect-related emission in CdS hetero-epitaxial films exhibits similar behaviours to the so-called “Y-line” observed in other zincblende structure II-VI semiconductor films such as ZnSe/GaAs or ZnTe/GaAs heteroepitaxial films. (© 2006 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)

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