Volume 220, Issue 16 2370033
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Power Performance of AlGaN/GaN High-Electron-Mobility Transistors with AlN Buffer on SiC Substrate at 3.5 GHz

Minho Kim

Minho Kim

Department of Nano & Semiconductor Engineering, Tech University of Korea, Siheung-si, Gyeonggi-do, 15073 Korea

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Uiho Choi

Uiho Choi

Department of Nano & Semiconductor Engineering, Tech University of Korea, Siheung-si, Gyeonggi-do, 15073 Korea

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Keono Kim

Keono Kim

Department of Nano & Semiconductor Engineering, Tech University of Korea, Siheung-si, Gyeonggi-do, 15073 Korea

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Yunseok Heo

Yunseok Heo

Department of Nano & Semiconductor Engineering, Tech University of Korea, Siheung-si, Gyeonggi-do, 15073 Korea

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Kyeongjae Lee

Kyeongjae Lee

Foundry Business Unit, WAVICE Inc., 2/F 46, Samsung 1-ro 5-gil, Hwaseong-si, Gyeonggi-do, 18449 Korea

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Sangmin Lee

Sangmin Lee

Foundry Business Unit, WAVICE Inc., 2/F 46, Samsung 1-ro 5-gil, Hwaseong-si, Gyeonggi-do, 18449 Korea

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Okhyun Nam

Corresponding Author

Okhyun Nam

Department of Nano & Semiconductor Engineering, Tech University of Korea, Siheung-si, Gyeonggi-do, 15073 Korea

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First published: 18 August 2023

Graphical Abstract

Power Performance of AlGaN/GaN HEMTs

In article number 2200826, Okhyun Nam and colleagues present the power performance of an AlGaN/GaN HEMT with AlN buffer on a 4-inch SiC substrate, grown by high-temperature metalorganic chemical vapor deposition. The fabricated devices were examined and showed positive characteristics, such as low slump ratio and breakdown voltage. The results demonstrate the potential of using an AlN buffer HEMT in high-power RF devices of the future.

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