Volume 206, Issue 8 pp. 1744-1747
Original Paper

Interfacial roughness of Fe3Si/GaAs(001) films studied by X-ray crystal truncation rods

Vladimir Kaganer

Corresponding Author

Vladimir Kaganer

Paul-Drude-Institut für Festkörperelektronik, Hausvogteiplatz 5–7, 10117 Berlin, Germany

Phone: +49-30-20377486, Fax: +49-30-20377201Search for more papers by this author
Bernd Jenichen

Bernd Jenichen

Paul-Drude-Institut für Festkörperelektronik, Hausvogteiplatz 5–7, 10117 Berlin, Germany

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Roman Shayduk

Roman Shayduk

Paul-Drude-Institut für Festkörperelektronik, Hausvogteiplatz 5–7, 10117 Berlin, Germany

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Wolfgang Braun

Wolfgang Braun

Paul-Drude-Institut für Festkörperelektronik, Hausvogteiplatz 5–7, 10117 Berlin, Germany

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First published: 27 July 2009

Abstract

Crystal truncation rods (CTRs) from thin Fe3Si films grown on GaAs(001) by molecular beam epitaxy (MBE) are measured at different stages of deposition. The films do not develop their own surface roughness but are conformal to the substrate, so that the substrate roughness governs the whole system. A factor that describes the roughness of a zinc blende structure in the β model of terrace height probabilities is derived and applied to describe the experimental curves. We show that the β model adequately describes the CTRs while the model of continuous Gaussian fluctuations of the surface height notably underestimates the root-mean-squared (rms) roughness.

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