Volume 197, Issue 1 pp. 117-122
Original Paper

Etchant composition effects on porous silicon morphology and photoluminescence

L. Koker

L. Koker

School of Chemistry, The University of Birmingham, Edgbaston, Birmingham, B15 2TT, United Kingdom

Current address: QinetiQ, St Andrews Road, Malvern, Worcs, WR14 3PS, United Kingdom

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A. Wellner

A. Wellner

Nanoscale Physics Research Laboratory and the School of Physics and Astronomy, The University of Birmingham, Edgbaston, Birmingham, B15 2TT, United Kingdom

Current address: Laboratoire de Physique des Solides, UMR 5477, Université Paul Sabatier, 118 route de Narbonne, 31062 Toulouse Cedex 4, France

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P. A. J. Sherratt

P. A. J. Sherratt

School of Chemistry, The University of Birmingham, Edgbaston, Birmingham, B15 2TT, United Kingdom

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R. Neuendorf

R. Neuendorf

Nanoscale Physics Research Laboratory and the School of Physics and Astronomy, The University of Birmingham, Edgbaston, Birmingham, B15 2TT, United Kingdom

Current address: Carl v. Ossietzky Universität Oldenburg, Fachbereich 9, Postfach 2503, 2611 Oldenburg, Germany

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K. W. Kolasinski

Corresponding Author

K. W. Kolasinski

School of Chemistry, The University of Birmingham, Edgbaston, Birmingham, B15 2TT, United Kingdom

Current address: Department of Chemistry, Queen Mary, University of London, Mile End Road, London E1 4NS, United Kingdom

Tel.: +44-20 7882 3255, Fax: +44-20 7782 7794Search for more papers by this author
First published: 23 April 2003
Citations: 5

Abstract

Laser assisted etching of n-type silicon, without an applied potential, to form porous silicon has been studied in a variety of etchants. The range of pore diameters correlates with the ratio of the activities of HF and HF2. Where the activity ratio HF2: HF is low, small (<10 nm) pores are formed, while where HF2: HF is high only larger pores (20–100 nm) are observed. The dependence of pore morphology on etchant composition demonstrates the importance of specific etch chemistry during pore formation. The composition of the film is also affected by the etchant. In particular hexafluorosilicates can deposit during porous silicon formation in solutions containing K+, Rb+ and Cs+. The presence of hexafluorosilicates strongly affects the photoluminescence from the layers. We ascribe the strong, blue-shifted photoluminescence to emission from states at the hexafluorosilicate/Si interface.

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