Volume 151, Issue 2 pp. 40-45

Low-resistive and transparent AZO films prepared by PLD in magnetic field

Hideaki Agura

Hideaki Agura

Osaka Sangyo University, Japan

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Hirokazu Okinaka

Hirokazu Okinaka

Osaka Sangyo University, Japan

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Shigeyasu Hoki

Shigeyasu Hoki

Osaka Sangyo University, Japan

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Takanori Aoki

Takanori Aoki

Osaka Sangyo University, Japan

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Akio Suzuki

Akio Suzuki

Osaka Sangyo University, Japan

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Tatsuhiko Matsushita

Tatsuhiko Matsushita

Osaka Sangyo University, Japan

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Masahiro Okuda

Masahiro Okuda

Osaka Prefecture University, Japan

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First published: 09 February 2005
Citations: 11

Abstract

Al2O3-doped ZnO (AZO) thin films have been deposited onto glass substrates using a split target consisting of AZO (1 wt%) and AZO (2 wt%) by pulsed laser deposition with an ArF excimer laser (λ = 193 nm, 15 mJ, 10 Hz, 0.75 J/cm2). By applying a magnetic field perpendicular to the plume, the lowest resistivity of 8.54 × 10−5Ω·cm and an average transmittance exceeding 91% over the visible range were obtained at a target-to-substrate distance of 25 mm for approximately 279-nm-thick AZO film (1.8 wt%) grown at a substrate temperature of 230 °C in vacuum. From cross-sectional TEM observations and the XRD spectrum, a reason why the low resistivity (54 × 10−5Ω·cm) was reproducibly obtained was considered to be due to the fact that a disorder of crystal growth originating in the vicinity of the interface between the substrate and the film was suppressed by application of the magnetic field and the c-axis orientation took preference, giving rise to the increase of mobility. © 2005 Wiley Periodicals, Inc. Electr Eng Jpn, 151(2): 40–45, 2005; Published online in Wiley InterScience (www.interscience.wiley.com). DOI 10.1002/eej.20026

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