New planar magnetron system for ferromagnetic targets–Magnetic field distribution near the target surface

A new exposed pole-type planar magnetron system for sputter deposition from ferromagnetic targets is proposed. Because the system uses a washer-shaped target, both magnetic poles are exposed at the target surface. This allows great increase in the tangential magnetic field component at the target surface. We used three targets herein: the new washer-shaped ferromagnetic (Fe), conventional nonmagnetic (A1), and ferromagnetic (Fe) targets. the magnetic field distribution over each target was measured as a function of the current through a field confinement solenoid coil. the tangential component of the magnetic flux density over the washer-shaped Fe target was much larger than over the conventional ferromagnetic target, showing clearly the effect of the exposed poles. However, when compared with the nonmagnetic target, the tangential component is still small and the effect of the solenoid coil weak. the tangential component of the magnetic flux density is changed by the vector addition of the horizontal component of the solenoid coil field.