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Volume 31, Issue 23

Reviews

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ChemInform Abstract: Asymmetric Synthesis of an Endothelin Receptor Antagonist

Paul N. Devine,

Paul N. Devine

Dep. Process Res., Merck Res. Lab., Merck&Co., Inc., Rahway, NJ 07065, USA

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Richard Desmond,

Richard Desmond

Dep. Process Res., Merck Res. Lab., Merck&Co., Inc., Rahway, NJ 07065, USA

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Lisa F. Frey

Dep. Process Res., Merck Res. Lab., Merck&Co., Inc., Rahway, NJ 07065, USA

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Richard M. Heid,

Richard M. Heid

Dep. Process Res., Merck Res. Lab., Merck&Co., Inc., Rahway, NJ 07065, USA

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Zhiguo Song

Dep. Process Res., Merck Res. Lab., Merck&Co., Inc., Rahway, NJ 07065, USA

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Richard D. Tillyer,

Richard D. Tillyer

Dep. Process Res., Merck Res. Lab., Merck&Co., Inc., Rahway, NJ 07065, USA

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David M. Tschaen,

David M. Tschaen

Dep. Process Res., Merck Res. Lab., Merck&Co., Inc., Rahway, NJ 07065, USA

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Mangzhu Zhao

Dep. Process Res., Merck Res. Lab., Merck&Co., Inc., Rahway, NJ 07065, USA

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Yoshiaki Kato

Dep. Process Res., Merck Res. Lab., Merck&Co., Inc., Rahway, NJ 07065, USA

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Eiichi Mano

Dep. Process Res., Merck Res. Lab., Merck&Co., Inc., Rahway, NJ 07065, USA

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et al. et al.

Dep. Process Res., Merck Res. Lab., Merck&Co., Inc., Rahway, NJ 07065, USA

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Paul N. Devine,

Paul N. Devine

Dep. Process Res., Merck Res. Lab., Merck&Co., Inc., Rahway, NJ 07065, USA

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Richard Desmond,

Richard Desmond

Dep. Process Res., Merck Res. Lab., Merck&Co., Inc., Rahway, NJ 07065, USA

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Lisa F. Frey

Dep. Process Res., Merck Res. Lab., Merck&Co., Inc., Rahway, NJ 07065, USA

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Richard M. Heid,

Richard M. Heid

Dep. Process Res., Merck Res. Lab., Merck&Co., Inc., Rahway, NJ 07065, USA

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Zhiguo Song

Dep. Process Res., Merck Res. Lab., Merck&Co., Inc., Rahway, NJ 07065, USA

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Richard D. Tillyer,

Richard D. Tillyer

Dep. Process Res., Merck Res. Lab., Merck&Co., Inc., Rahway, NJ 07065, USA

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David M. Tschaen,

David M. Tschaen

Dep. Process Res., Merck Res. Lab., Merck&Co., Inc., Rahway, NJ 07065, USA

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Mangzhu Zhao

Dep. Process Res., Merck Res. Lab., Merck&Co., Inc., Rahway, NJ 07065, USA

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Yoshiaki Kato

Dep. Process Res., Merck Res. Lab., Merck&Co., Inc., Rahway, NJ 07065, USA

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Eiichi Mano

Dep. Process Res., Merck Res. Lab., Merck&Co., Inc., Rahway, NJ 07065, USA

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et al. et al.

Dep. Process Res., Merck Res. Lab., Merck&Co., Inc., Rahway, NJ 07065, USA

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First published: 08 June 2010

https://doi.org/10.1002/chin.200023264

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Abstract

ChemInform is a weekly Abstracting Service, delivering concise information at a glance that was extracted from about 100 leading journals. To access a ChemInform Abstract of an article which was published elsewhere, please select a “Full Text” option. The original article is trackable via the “References” option.

ChemInform Abstract

[45 refs.].

References

Volume31, Issue23

June 6, 2000

The full text of this article hosted at iucr.org is unavailable due to technical difficulties.